IEICE Technical Report

Online edition: ISSN 2432-6380

Volume 124, Number 158

Electron Devices

Workshop Date : 2024-08-23 / Issue Date : 2024-08-16

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Table of contents

ED2024-13
[Invited Talk] Metal-Oxide Semiconductor Thin-Film Devices and Neuromorphic Systems
Mutsumi Kimura (Ryukoku Univ.)
pp. 1 - 4

ED2024-14
Nanothick TiO2 channel thin film transistors as gas and UV sensors
Fumihiko Hirose (Yamagata Univ.)
pp. 5 - 7

ED2024-15
Fabrication and Characterization of Indium Oxide Thin-Film Transistors using Excimer Light Assist Process
Ryosuke Kasahara, Takeaki Komai, Hideo Wada, Masatoshi Koyama, Akihiko Fujii (Osaka Inst. of Tech.), Akihiro Shimizu, Noritaka Takezoe, Shion Yamaguchi, Hiroyasu Ito (Ushio Inc.), Toshihiko Maemoto (Osaka Inst. of Tech.)
pp. 8 - 11

ED2024-16
Fabrication of ZnO Thin Films by Mist CVD and the characteristic variation by heat treatment.
Ryosuke Ohashi, Tatsuki Okada, Htet Su Wai, Yasuoka Tatsuya, Toshiyuki Kawaharamura (KUT)
pp. 12 - 14

ED2024-17
UV Detection Properties of Mist CVD Grown Amorphous Ga2O3 Thin Films
Manami Miyazaki, Iori Yamasaki, Yuma Tanaka, Masatoshi Koyama, Akihiko Fujii, Toshihiko Maemoto (OIT)
pp. 15 - 18

ED2024-18
Defect analysis in α-(AlxGa1-x)2O3 buffer layers
Tatsuya Yasuoka, Li Liu, Dang Thai Giang, Toshiyuki Kawaharamura (KUT)
pp. 19 - 20

ED2024-19
Cu thin films produced by mist CVD method and related properties
Okada Tatsuki, Ryousuke Ohashi, Tatsuya Yasuoka, Htet Su Wai, Toshiyuki Kawaharamura (Kochi University of Technology)
pp. 21 - 23

Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan