Online edition: ISSN 2432-6380
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CPM2026-10
Electrical properties of boron carbide/n-type silicon heterostructures fabricated by magnetron sputtering
Iori Akimoto, Norihito Nekoshima, Yushi Suzuki, Yasuyuki Kobayashi, Hideki Nakazawa (Hirosaki Univ.)
pp. 1 - 4
CPM2026-11
Evaluation of MoOx/Si heterojunction interfaces fabricated by ECR sputtering using conductance method and Cole-Cole plot.
Sota Miura, Futa Imai, Ryosuke Watanabe (Hirosaki Univ.)
pp. 5 - 8
CPM2026-12
Flatness Control of Cu(111) Thin Films on Sapphire Substrates by Annealing
Atsumu Sugawara, Hideki Nakazawa, Yasuyuki Kobayashi (Hirosaki Univ.)
pp. 9 - 12
CPM2026-13
Effect of Growth Rate on Crystallinity of Ni(111) Thin Films Grown on Sapphire Substrates
Nozomu Koda, Touma Ito, Hideki Nakazawa, Yasuyuki Kobayashi (Hirosaki Univ.)
pp. 13 - 16
CPM2026-14
Orientation of Cu films deposited on low-temperature-deposited ZrNx films
Masaru Sato, Mayumi B. Takeyama (Kitami Institute of Tech.)
pp. 17 - 18
CPM2026-15
Influence of Added Fillers on Mechanical and Functional Performance of Dental Materials
Mayumi B. Takeyama (Kitami Inst. Technol.), Katsumi Hiranuma (Science Tokyo), Masaru Sato (Kitami Inst. Technol.)
pp. 19 - 20
CPM2026-16
Effects of substrate bias on the properties of Si- and N-doped DLC films prepared by plasma-enhanced CVD
Rintaro Takemura, Ayame Hosokawa, Shota Ito, Yushi Suzuki, Yoshiharu Enta, Yasuyuki Kobayashi, Hideki Nakazawa (Hirosaki Univ.)
pp. 21 - 24
CPM2026-17
Fabrication Conditions and Evaluation of Diffraction Characteristics of Holographic Polarizing Beam Splitters
Taiki Kato, Fuga Suzuki (TUT), Toshihiro Kasezawa (Egarim), Hideyoshi Horimai (HOLOMEDIA), Yuichi Nakamura (TUT)
pp. 25 - 28
CPM2026-18
Fabrication of UV Light Detectors Using Oxide Semiconductor Nanowires Grown by Atmospheric-Pressure Chemical Vapor Deposition
Tomoaki Terasako, Rio Horiuchi, Tomoya Yamada (Ehime Univ.), Masakazu Yagi (Natl. Inst. Technol., Kagawa College)
pp. 29 - 32
CPM2026-19
Effect of Thermally Excited N2O Gas on Oxynitridation of SiC(0001) Surface
Shota Ito, Kaede Mukuno, Yoshiharu Enta (Hirosaki Univ.)
pp. 33 - 36
CPM2026-20
Infrared spectroscopy of plasma enhanced chemical vapor deposition process using tetramethylsilane as a source molecule
Masanori Shinohara, Akihiro Iwata (Fukuoka Univ.), Ryo Miyazawa, Fumihiko Hirose (Yamagata Univ.)
pp. 37 - 40
Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.