Information: Join today and make your research activities more affordable! Technical workshop participation fees and annual registration fees are available at member rates.
Notice: [Important] Announcement of Changes to Registration Fee Payment and Manuscript Upload Procedures for IEICE Technical Meetings
IEICE Technical Committee Submission System
Conference Paper's Information		 Online Proceedings
[Sign in]
Tech. Rep. Archives
 Go Top Page Go Previous   [Japanese] / [English] 

Paper Abstract and Keywords
Presentation 2026-07-16 11:20
Infrared spectroscopy of plasma enhanced chemical vapor deposition process using tetramethylsilane as a source molecule
Masanori Shinohara, Akihiro Iwata (Fukuoka Univ.), Ryo Miyazawa, Fumihiko Hirose (Yamagata Univ.) CPM2026-20
Abstract (in Japanese) (See Japanese page) 
(in English) (Available after conference date)
Keyword (in Japanese) (See Japanese page) 
(in English) Plasma enhanced chemical vapor deposition / tetramethylsilane / Infrared absorption spectroscopy / / / / /  
Reference Info. IEICE Tech. Rep., vol. 126, no. 113, CPM2026-20, pp. 37-40, July 2026.
Paper # CPM2026-20 
Date of Issue 2026-07-08 (CPM) 
ISSN Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2026-20

Conference Information
Committee CPM  
Conference Date 2026-07-15 - 2026-07-16 
Place (in Japanese) (See Japanese page) 
Place (in English) 50th Anniversary Auditorium 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Component Parts and Materials, etc. 
Paper Information
Registration To CPM 
Conference Code 2026-07-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Infrared spectroscopy of plasma enhanced chemical vapor deposition process using tetramethylsilane as a source molecule 
Sub Title (in English)  
Keyword(1) Plasma enhanced chemical vapor deposition  
Keyword(2) tetramethylsilane  
Keyword(3) Infrared absorption spectroscopy  
Keyword(4)  
Keyword(5)  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Masanori Shinohara  
1st Author's Affiliation Fukuoka University (Fukuoka Univ.)
2nd Author's Name Akihiro Iwata  
2nd Author's Affiliation Fukuoka University (Fukuoka Univ.)
3rd Author's Name Ryo Miyazawa  
3rd Author's Affiliation Yamagata University (Yamagata Univ.)
4th Author's Name Fumihiko Hirose  
4th Author's Affiliation Yamagata University (Yamagata Univ.)
5th Author's Name  
5th Author's Affiliation ()
6th Author's Name  
6th Author's Affiliation ()
7th Author's Name  
7th Author's Affiliation ()
8th Author's Name  
8th Author's Affiliation ()
9th Author's Name  
9th Author's Affiliation ()
10th Author's Name  
10th Author's Affiliation ()
11th Author's Name  
11th Author's Affiliation ()
12th Author's Name  
12th Author's Affiliation ()
13th Author's Name  
13th Author's Affiliation ()
14th Author's Name  
14th Author's Affiliation ()
15th Author's Name  
15th Author's Affiliation ()
16th Author's Name  
16th Author's Affiliation ()
17th Author's Name  
17th Author's Affiliation ()
18th Author's Name  
18th Author's Affiliation ()
19th Author's Name  
19th Author's Affiliation ()
20th Author's Name  
20th Author's Affiliation ()
21st Author's Name  
21st Author's Affiliation ()
22nd Author's Name  
22nd Author's Affiliation ()
23rd Author's Name  
23rd Author's Affiliation ()
24th Author's Name  
24th Author's Affiliation ()
25th Author's Name  
25th Author's Affiliation ()
26th Author's Name / /
26th Author's Affiliation ()
()
27th Author's Name / /
27th Author's Affiliation ()
()
28th Author's Name / /
28th Author's Affiliation ()
()
29th Author's Name / /
29th Author's Affiliation ()
()
30th Author's Name / /
30th Author's Affiliation ()
()
31st Author's Name / /
31st Author's Affiliation ()
()
32nd Author's Name / /
32nd Author's Affiliation ()
()
33rd Author's Name / /
33rd Author's Affiliation ()
()
34th Author's Name / /
34th Author's Affiliation ()
()
35th Author's Name / /
35th Author's Affiliation ()
()
36th Author's Name / /
36th Author's Affiliation ()
()
Speaker Author-1 
Date Time 2026-07-16 11:20:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2026-20 
Volume (vol) vol.126 
Number (no) no.113 
Page pp.37-40 
#Pages 4 
Date of Issue 2026-07-08 (CPM) 

[Return to Top Page]

[Return to IEICE Web Page]
The Institute of Electronics, Information and Communication Engineers (IEICE), Japan