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Paper Abstract and Keywords
Presentation 2008-04-11 11:25
Evaluation of stress and crystallinity of laser crystallization polysilicon thin film using UV/Visible Raman spectroscopy
Yasuto Kakemura, Daisuke Kosemura, Atsushi Ogura (Meiji Univ.), Takashi Noguchi (Univ. of the Ryukyus) SDM2008-6 OME2008-6
Abstract (in Japanese) (See Japanese page) 
(in English) Low temperature polysilicon (LTPS) thin film is a key material for the systems-on-glass achievement. Depth and in-plane distributions of the crystal qualities in low-temperature polycrystalline Si (LTPS) films fabricated by various annealing conditions with laser annealing were evaluated by high resolution Raman spectroscopy with UV and visible excitation laser sources from the front and back surfaces. Crystal quality and residual stress measured by the Raman peak shift and FWHM significantly depended on the annealing conditions. The depth profile was also unique to each sample.
Keyword (in Japanese) (See Japanese page) 
(in English) Low temperature polysilicon / LTPS / systems-on-glass / UV-Raman / Quasi-line excitation sources / / /  
Reference Info. IEICE Tech. Rep., vol. 108, no. 1, SDM2008-6, pp. 27-32, April 2008.
Paper # SDM2008-6 
Date of Issue 2008-04-04 (SDM, OME) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2008-6 OME2008-6

Conference Information
Committee SDM OME  
Conference Date 2008-04-11 - 2008-04-12 
Place (in Japanese) (See Japanese page) 
Place (in English) Okinawa Seinen Kaikan 
Topics (in Japanese) (See Japanese page) 
Topics (in English) TFT Materials, Devices, and Applications and Others related to SDM and OME activity 
Paper Information
Registration To SDM 
Conference Code 2008-04-SDM-OME 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Evaluation of stress and crystallinity of laser crystallization polysilicon thin film using UV/Visible Raman spectroscopy 
Sub Title (in English)  
Keyword(1) Low temperature polysilicon  
Keyword(2) LTPS  
Keyword(3) systems-on-glass  
Keyword(4) UV-Raman  
Keyword(5) Quasi-line excitation sources  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Yasuto Kakemura  
1st Author's Affiliation Meiji University (Meiji Univ.)
2nd Author's Name Daisuke Kosemura  
2nd Author's Affiliation Meiji University (Meiji Univ.)
3rd Author's Name Atsushi Ogura  
3rd Author's Affiliation Meiji University (Meiji Univ.)
4th Author's Name Takashi Noguchi  
4th Author's Affiliation University of the Ryukyus (Univ. of the Ryukyus)
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Speaker Author-1 
Date Time 2008-04-11 11:25:00 
Presentation Time 25 minutes 
Registration for SDM 
Paper # SDM2008-6, OME2008-6 
Volume (vol) vol.108 
Number (no) no.1(SDM), no.2(OME) 
Page pp.27-32 
#Pages 6 
Date of Issue 2008-04-04 (SDM, OME) 

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