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| Presentation | 2008-05-16 13:15 Effect of strain relaxation process on polarization in strained superlattice spin-polarized photocathode Yuya Maeda, Jin Xiuguang, Masatoshi Tanioku, Shingo Fuchi, Toru Ujihara, Yoshikazu Takeda, Naoto Yamamoto, Atsushi Mano, Yasuhide Nakagawa, Masahiro Yamamoto, Shoji Okumi, Nakanishi Tsutomu (Nagoya Univ.), Takashi Saka (Daido institute of Technology), Horinaka Hiromiti (Osaka Prefecture Univ.), Toshihiro Kato (Daido Steel Co. Ltd)  ED2008-16 CPM2008-24 SDM2008-36 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | We successfully developed a super-high brightness and high-spin-polarization electron source based on GaAs/GaAsP strain superlattice. In the development, we found out that the polarization of superlattice grown on a GaP substrate was lower than that on a GaAs substrate, and inserting a GaAs interlayer on a GaP substrate improved the polarization. From a viewpoint of strain relaxation process in a GaAsP buffer layer, the mechanism of polarization degradation was investigated. The buffer layer with in-plain tensile strain is relaxed by inducing some cracks. On the other hand, the buffer layer with in-plain compressive strain is relaxed by inducing some dislocations. A dislocation disturbs a spin of electron in the sample more effectively than a crack does. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | superlattice / lattice-mismatch / spin-polarization / photocathode / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 108, no. 35, CPM2008-24, pp. 75-80, May 2008. | |
| Paper # | CPM2008-24 | |
| Date of Issue | 2008-05-08 (ED, CPM, SDM) | |
| ISSN | Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | ED2008-16 CPM2008-24 SDM2008-36 |
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| Conference Information | |
| Committee | CPM ED SDM |
| Conference Date | 2008-05-15 - 2008-05-16 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Nagoya Institute of Technology |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Crystal growth, evaluation and device (Compound, Si, SiGe, Electronic and light emitting materials） |
| Paper Information | |
| Registration To | CPM |
| Conference Code | 2008-05-CPM-ED-SDM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Effect of strain relaxation process on polarization in strained superlattice spin-polarized photocathode |
| Sub Title (in English) | |
| Keyword(1) | superlattice |
| Keyword(2) | lattice-mismatch |
| Keyword(3) | spin-polarization |
| Keyword(4) | photocathode |
| Keyword(5) | |
| Keyword(6) | |
| Keyword(7) | |
| Keyword(8) | |
| 1st Author's Name | Yuya Maeda |
| 1st Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 2nd Author's Name | Jin Xiuguang |
| 2nd Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 3rd Author's Name | Masatoshi Tanioku |
| 3rd Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 4th Author's Name | Shingo Fuchi |
| 4th Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 5th Author's Name | Toru Ujihara |
| 5th Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 6th Author's Name | Yoshikazu Takeda |
| 6th Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 7th Author's Name | Naoto Yamamoto |
| 7th Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 8th Author's Name | Atsushi Mano |
| 8th Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 9th Author's Name | Yasuhide Nakagawa |
| 9th Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 10th Author's Name | Masahiro Yamamoto |
| 10th Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 11th Author's Name | Shoji Okumi |
| 11th Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 12th Author's Name | Nakanishi Tsutomu |
| 12th Author's Affiliation | Nagoya University (Nagoya Univ.) |
| 13th Author's Name | Takashi Saka |
| 13th Author's Affiliation | Daido institute of Technology (Daido institute of Technology) |
| 14th Author's Name | Horinaka Hiromiti |
| 14th Author's Affiliation | Osaka Prefecture University (Osaka Prefecture Univ.) |
| 15th Author's Name | Toshihiro Kato |
| 15th Author's Affiliation | Daido Steel Co. Ltd (Daido Steel Co. Ltd) |
| Speaker | Author-1 |
| Date Time | 2008-05-16 13:15:00 |
| Presentation Time | 25 minutes |
| Registration for | CPM |
| Paper # | ED2008-16, CPM2008-24, SDM2008-36 |
| Volume (vol) | vol.108 |
| Number (no) | no.34(ED), no.35(CPM), no.36(SDM) |
| Page | pp.75-80 |
| #Pages | 6 |
| Date of Issue | 2008-05-08 (ED, CPM, SDM) |
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