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Paper Abstract and Keywords
Presentation 2010-07-29 14:55
Epitaxial growth of ZnO films using hot water molecules generated by catalytic reaction
Masami Tahara, Hitoshi Miura, Tomoyoshi Kuroda, Hiroshi Nishiyama, Kanji Yasui (Nagoka Univ. of Tech.) CPM2010-33 Link to ES Tech. Rep. Archives: CPM2010-33
Abstract (in Japanese) (See Japanese page) 
(in English) We have developed a new CVD method for thin film growth of metal oxides using a reaction between organometallic compounds and high-energy H2O produced by a Pt-catalyzed H2O2 reaction. Using this CVD method, epitaxial growth of ZnO films on sapphire substrates was investigated. ZnO epitaxial films were grown directly on a-plane (11-20) sapphire substrates at substrate temperatures of 573-873 K without buffer layer. X-ray diffraction patterns exhibited intense (0002) and (0004) peaks from the ZnO(0001) index plane. The smallest full width at half maximum (FWHM) value of the ω-rocking curve of ZnO(0002) was less than 0.1deg (273 arcsec). The Hall mobility and residual carrier concentration of the epilayers were in the ranges 140-168 cm2V1s1 and 1.6-6×1017 cm3, respectively. Optical transparency of the ZnO samples grown on the sapphire substrates was more than 95% that of the sample without ZnO film.
Keyword (in Japanese) (See Japanese page) 
(in English) ZnO / catalytic reaction / high-energy H2O / X-ray diffraction pattern / Hall mobility / optical transparency / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 154, CPM2010-33, pp. 11-15, July 2010.
Paper # CPM2010-33 
Date of Issue 2010-07-22 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2010-33 Link to ES Tech. Rep. Archives: CPM2010-33

Conference Information
Committee CPM  
Conference Date 2010-07-29 - 2010-07-30 
Place (in Japanese) (See Japanese page) 
Place (in English) Michino-Eki Shari Meeting Room 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2010-07-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Epitaxial growth of ZnO films using hot water molecules generated by catalytic reaction 
Sub Title (in English)  
Keyword(1) ZnO  
Keyword(2) catalytic reaction  
Keyword(3) high-energy H2O  
Keyword(4) X-ray diffraction pattern  
Keyword(5) Hall mobility  
Keyword(6) optical transparency  
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Keyword(8)  
1st Author's Name Masami Tahara  
1st Author's Affiliation Nagaok University of Technology (Nagoka Univ. of Tech.)
2nd Author's Name Hitoshi Miura  
2nd Author's Affiliation Nagaok University of Technology (Nagoka Univ. of Tech.)
3rd Author's Name Tomoyoshi Kuroda  
3rd Author's Affiliation Nagaok University of Technology (Nagoka Univ. of Tech.)
4th Author's Name Hiroshi Nishiyama  
4th Author's Affiliation Nagaok University of Technology (Nagoka Univ. of Tech.)
5th Author's Name Kanji Yasui  
5th Author's Affiliation Nagaok University of Technology (Nagoka Univ. of Tech.)
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Speaker Author-5 
Date Time 2010-07-29 14:55:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2010-33 
Volume (vol) vol.110 
Number (no) no.154 
Page pp.11-15 
#Pages
Date of Issue 2010-07-22 (CPM) 


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