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Paper Abstract and Keywords
Presentation 2010-10-28 17:05
Formation of SrAl2O4:Eu, Dy thin films by combined the Unbalanced Magnetron Sputtering and the Facing Target Sputtering Method
Takashi Kuno, Minoru Saito, Kazuaki Kobayashi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.) CPM2010-97
Abstract (in Japanese) (See Japanese page) 
(in English) In order to examine deposition rate and characteristics of thin films,SrAl2O4 : Eu2+,Dy3+ thin films was attempted by post-annealing in vacuum less than 3.0×10-3 Pa of the films deposited with conventional facing target sputtering (FTS) method and combined the unbalanced magnetron sputtering(UBMS) and the facing target sputtering method. As a result, the deposition rate was slightly faster FTS+UBMS method than conventional FTS method. All the films by post-annealing in vacuum were observed remarkable luminescence emission spectrum. All the films had luminescence from wavelength of about 420 nm, 530 nm, and 670 nm.
Keyword (in Japanese) (See Japanese page) 
(in English) SrAl2O4 : Eu2+,Dy3+ thin films / long-lasting phosphorescence / sputtering method / post-annealing in vacuum / / / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 261, CPM2010-97, pp. 33-37, Oct. 2010.
Paper # CPM2010-97 
Date of Issue 2010-10-21 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2010-10-28 - 2010-10-29 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2010-10-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Formation of SrAl2O4:Eu, Dy thin films by combined the Unbalanced Magnetron Sputtering and the Facing Target Sputtering Method 
Sub Title (in English)  
Keyword(1) SrAl2O4 : Eu2+,Dy3+ thin films  
Keyword(2) long-lasting phosphorescence  
Keyword(3) sputtering method  
Keyword(4) post-annealing in vacuum  
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Keyword(6)  
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1st Author's Name Takashi Kuno  
1st Author's Affiliation Niigata University (Niigata Univ.)
2nd Author's Name Minoru Saito  
2nd Author's Affiliation Niigata University (Niigata Univ.)
3rd Author's Name Kazuaki Kobayashi  
3rd Author's Affiliation Niigata University (Niigata Univ.)
4th Author's Name Hidehiko Shimizu  
4th Author's Affiliation Niigata University (Niigata Univ.)
5th Author's Name Haruo Iwano  
5th Author's Affiliation Niigata University (Niigata Univ.)
6th Author's Name Takahiro Kawakami  
6th Author's Affiliation Niigata University (Niigata Univ.)
7th Author's Name Yasuo Fukushima  
7th Author's Affiliation Niigata University (Niigata Univ.)
8th Author's Name Kotaro Nagata  
8th Author's Affiliation Niigata University (Niigata Univ.)
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Speaker Author-1 
Date Time 2010-10-28 17:05:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2010-97 
Volume (vol) vol.110 
Number (no) no.261 
Page pp.33-37 
#Pages 5 
Date of Issue 2010-10-21 (CPM) 

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