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Paper Abstract and Keywords
Presentation 2011-02-07 13:10
Networked nanographite growth using photoemission-assisted enhanced plasma CVD: discharge condition dependence of the crystallographic quality
Shuichi Ogawa (Tohoku Univ./JST), Motonobu Sato (Fujitsu/JST), Haruki Sumi (Tohoku Univ.), Mizuhisa Nihei (Fujitsu/JST), Yuji Takakuwa (Tohoku Univ./JST) SDM2010-220
Abstract (in Japanese) (See Japanese page) 
(in English) he photoemission-assisted plasma chemical vapor deposition has been developed to form the graphene for large area without any catalysts in low temperature. In this study, we have investigated the plasma voltage dependence of the crystallographic quality of networked nanographite (NNG). The width of Raman spectra, which indicates the crystallographic quality of the graphitic materials, grown by photoemission-assisted plasma is narrower than that by traditional DC discharge plasma. Furthermore, it is found that the G band width of NNG grown at 200 V of plasma voltage is narrower than that of carbon nanowall grown by the microwave plasma CVD.
Keyword (in Japanese) (See Japanese page) 
(in English) Photoemission-assisted plasma / Nanographite / Multilayer graphene / plasma-enhanced chemical vapor deposition / Raman spectroscopy / / /  
Reference Info. IEICE Tech. Rep., vol. 110, no. 408, SDM2010-220, pp. 25-30, Feb. 2011.
Paper # SDM2010-220 
Date of Issue 2011-01-31 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2011-02-07 - 2011-02-07 
Place (in Japanese) (See Japanese page) 
Place (in English) Kikai-Shinko-Kaikan Bldg. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To SDM 
Conference Code 2011-02-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Networked nanographite growth using photoemission-assisted enhanced plasma CVD: discharge condition dependence of the crystallographic quality 
Sub Title (in English)  
Keyword(1) Photoemission-assisted plasma  
Keyword(2) Nanographite  
Keyword(3) Multilayer graphene  
Keyword(4) plasma-enhanced chemical vapor deposition  
Keyword(5) Raman spectroscopy  
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1st Author's Name Shuichi Ogawa  
1st Author's Affiliation IMRAM, Tohoku University/CREST-JST (Tohoku Univ./JST)
2nd Author's Name Motonobu Sato  
2nd Author's Affiliation Fujitsu/CREST-JST (Fujitsu/JST)
3rd Author's Name Haruki Sumi  
3rd Author's Affiliation IMRAM, Tohoku University (Tohoku Univ.)
4th Author's Name Mizuhisa Nihei  
4th Author's Affiliation Fujitsu/CREST-JST (Fujitsu/JST)
5th Author's Name Yuji Takakuwa  
5th Author's Affiliation IMRAM, Tohoku University/CREST-JST (Tohoku Univ./JST)
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Speaker Author-1 
Date Time 2011-02-07 13:10:00 
Presentation Time 30 minutes 
Registration for SDM 
Paper # SDM2010-220 
Volume (vol) vol.110 
Number (no) no.408 
Page pp.25-30 
#Pages 6 
Date of Issue 2011-01-31 (SDM) 

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