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Paper Abstract and Keywords
Presentation 2011-07-29 16:35
Inductively coupled plasma etching of Al-rich AlGaAs for Photonic Crystal Fabrication
Yuta Kitabayashi, Masaya Mochizuki, Fumitaro Ishikawa, Masahiko Kondow (Osaka Univ.) ED2011-44
Abstract (in Japanese) (See Japanese page) 
(in English) We investigate inductively coupled plasma deep dry etching of Al$_{0.8}$Ga$_{0.2}$As for photonic crystal（PC）fabrication using Cl$_2$/BCl$_3$/CH$_4$ chemistry.
Characteristic AlO$_x$ deposition is observed at etching, resulting
in the reduction of the etching rate. BCl$_3$ is considered to scavenge the deposited AlO$_x$ by its reductive
reaction. CH$_4$ make polymer, having a effect of side wall protection.
Concerning the impact of pattern size, pronounced inverse RIE lag is observed, which is beneficial for the
small size PC fabrication typically having its holes diameter of several hundred nm. From the findings,
we successfully fabricate PCs structure with the air holes having its aspect ratio of 8 having its diameter 110 nm.
Keyword (in Japanese) (See Japanese page) 
(in English) Inductively coupled plasma etching / Al-rich AlGaAs / Photonic crystal / inverse RIE lag / / / /  
Reference Info. IEICE Tech. Rep., vol. 111, no. 167, ED2011-44, pp. 35-39, July 2011.
Paper # ED2011-44 
Date of Issue 2011-07-22 (ED) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2011-44

Conference Information
Committee ED  
Conference Date 2011-07-29 - 2011-07-30 
Place (in Japanese) (See Japanese page) 
Place (in English) Multimedia system center, Nagaoka Univ. of Tech. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) TFT (organic,oxide), Semiconductor process (surface, interface, reliability), etc. 
Paper Information
Registration To ED 
Conference Code 2011-07-ED 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Inductively coupled plasma etching of Al-rich AlGaAs for Photonic Crystal Fabrication 
Sub Title (in English)  
Keyword(1) Inductively coupled plasma etching  
Keyword(2) Al-rich AlGaAs  
Keyword(3) Photonic crystal  
Keyword(4) inverse RIE lag  
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1st Author's Name Yuta Kitabayashi  
1st Author's Affiliation Osaka University (Osaka Univ.)
2nd Author's Name Masaya Mochizuki  
2nd Author's Affiliation Osaka University (Osaka Univ.)
3rd Author's Name Fumitaro Ishikawa  
3rd Author's Affiliation Osaka University (Osaka Univ.)
4th Author's Name Masahiko Kondow  
4th Author's Affiliation Osaka University (Osaka Univ.)
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Speaker Author-1 
Date Time 2011-07-29 16:35:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2011-44 
Volume (vol) vol.111 
Number (no) no.167 
Page pp.35-39 
#Pages 5 
Date of Issue 2011-07-22 (ED) 

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