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Paper Abstract and Keywords
Presentation 2011-11-29 13:00
[Invited Talk] Ultra-precision measurement & fabrication technology of LSI and its materials for the next generation. -- Toward the atomic scale production applying novel opto-machanical methods --
Hiroshi Kubota, Yuki Soh, Seiya Matsukawa (Kumamoto Univ.), Kouji Kosaka, Tadayuki Kyotani (PMT) CPM2011-157 ICD2011-89
Abstract (in Japanese) (See Japanese page) 
(in English) Beyond the high-mix low-volume manufacturing era, advanced semiconductor production requires various kinds of products in large lots instead of the low-volume ones because the production line should keep running to realize the reduction of the cost by quantity output effect. The set of the individual products in the line should be converted quickly and reset dynamically. What we have to develop are, 1) fine NaPFA scales (nano-, pico-, femt-, atto-scales) syntheses and metrologies, 2)knowledge based IT techniques, e.g. virtual metrology, feed forward control, statistical fault detection. We present Ultra-precision measurement & fabrication technology by using of opto-mechanical methods.
Keyword (in Japanese) (See Japanese page) 
(in English) Next generation LSI / mass-production / atomic scale / production / / / /  
Reference Info. IEICE Tech. Rep., vol. 111, no. 326, CPM2011-157, pp. 43-45, Nov. 2011.
Paper # CPM2011-157 
Date of Issue 2011-11-21 (CPM, ICD) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF CPM2011-157 ICD2011-89

Conference Information
Committee VLD DC IPSJ-SLDM CPSY RECONF ICD CPM  
Conference Date 2011-11-28 - 2011-11-30 
Place (in Japanese) (See Japanese page) 
Place (in English) NewWelCity Miyazaki 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Gaia 2010 -New Field of VLSI Design- 
Paper Information
Registration To CPM 
Conference Code 2011-11-VLD-DC-SLDM-CPSY-RECONF-ICD-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Ultra-precision measurement & fabrication technology of LSI and its materials for the next generation. 
Sub Title (in English) Toward the atomic scale production applying novel opto-machanical methods 
Keyword(1) Next generation LSI  
Keyword(2) mass-production  
Keyword(3) atomic scale  
Keyword(4) production  
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1st Author's Name Hiroshi Kubota  
1st Author's Affiliation Kumamoto University (Kumamoto Univ.)
2nd Author's Name Yuki Soh  
2nd Author's Affiliation Kumamoto University (Kumamoto Univ.)
3rd Author's Name Seiya Matsukawa  
3rd Author's Affiliation Kumamoto University (Kumamoto Univ.)
4th Author's Name Kouji Kosaka  
4th Author's Affiliation PMT Corporation (PMT)
5th Author's Name Tadayuki Kyotani  
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Speaker Author-1 
Date Time 2011-11-29 13:00:00 
Presentation Time 50 minutes 
Registration for CPM 
Paper # CPM2011-157, ICD2011-89 
Volume (vol) vol.111 
Number (no) no.326(CPM), no.327(ICD) 
Page pp.43-45 
#Pages 3 
Date of Issue 2011-11-21 (CPM, ICD) 

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