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Paper Abstract and Keywords
Presentation 2013-08-02 09:20
Development of Substrate Heater System of Cold-Wall Chemical Vapor Deposition Equipment for Improvement of Single-Walled Nanotubes Quality
Yusaku Tsuda, Takumi Sagara, Kenichi Yamakawa, Keisuke Yoshida, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.) CPM2013-47
Abstract (in Japanese) (See Japanese page) 
(in English) We have developed an alcohol catalytic chemical vapor deposition (ACCVD) process in order to fabricate nanoscaled electronic devices using single-walled carbon nanotubes (SWNTs). A cold wall chemical vapor deposition (CVD) was adopted for preparation of SWNTs, and a structure of a substrate heater of the CVD apparatus was improved to obtain the optimum preparation conditions of high quality SWNTs. As a result the growth conditions of high quality SWNTs were studied. Furthermore a novel process was also developed to selectively control the chirality of SWNTs by in-situ irradiation of free electron laser (FEL) during the successful SWNTs growth. It was found that only semiconducting SWNTs were grown by 800 nm FEL irradiation, while various kinds of chirality appeared in SWNTs prepared by a conventional CVD process without FEL irradiation. From the obtained results a hopeful process was demonstrated for realization of new SWNTs electronic devices.
Keyword (in Japanese) (See Japanese page) 
(in English) single-walled carbon nanotubes / chemical vapor deposition / substrate heater / free electron laser / chirality control / / /  
Reference Info. IEICE Tech. Rep., vol. 113, no. 171, CPM2013-47, pp. 39-44, Aug. 2013.
Paper # CPM2013-47 
Date of Issue 2013-07-25 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2013-08-01 - 2013-08-02 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2013-08-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Development of Substrate Heater System of Cold-Wall Chemical Vapor Deposition Equipment for Improvement of Single-Walled Nanotubes Quality 
Sub Title (in English)  
Keyword(1) single-walled carbon nanotubes  
Keyword(2) chemical vapor deposition  
Keyword(3) substrate heater  
Keyword(4) free electron laser  
Keyword(5) chirality control  
Keyword(6)  
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1st Author's Name Yusaku Tsuda  
1st Author's Affiliation Nihon University (Nihon Univ.)
2nd Author's Name Takumi Sagara  
2nd Author's Affiliation Nihon University (Nihon Univ.)
3rd Author's Name Kenichi Yamakawa  
3rd Author's Affiliation Nihon University (Nihon Univ.)
4th Author's Name Keisuke Yoshida  
4th Author's Affiliation Nihon University (Nihon Univ.)
5th Author's Name Nobuyuki Iwata  
5th Author's Affiliation Nihon University (Nihon Univ.)
6th Author's Name Hiroshi Yamamoto  
6th Author's Affiliation Nihon University (Nihon Univ.)
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Speaker Author-6 
Date Time 2013-08-02 09:20:00 
Presentation Time 20 minutes 
Registration for CPM 
Paper # CPM2013-47 
Volume (vol) vol.113 
Number (no) no.171 
Page pp.39-44 
#Pages 6 
Date of Issue 2013-07-25 (CPM) 

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