Paper Abstract and Keywords |
Presentation |
2014-12-12 17:15
Study of driving forces that cause resistive switching of binary transition metal oxide memory Ryosuke Koishi, Takumi Moriyama, Kouhei Kimura, Kouki Kawano, Hidetoshi Miyashita, Sang-Seon Lee, Satoru Kishida, Kentaro Kinoshita (Tottori Univ.) EID2014-37 SDM2014-132 Link to ES Tech. Rep. Archives: EID2014-37 SDM2014-132 |
Abstract |
(in Japanese) |
(See Japanese page) |
(in English) |
It is widely received that resistive switching of resistive random access memory (ReRAM) is caused by formation and rupture of conductive filament consisting of oxygen vacancies, Vos. However, driving forces that migrate oxygen vacancies have been not elucidated yet. In this study, we tried to separate driving forces that cause Vo diffusion, concentration gradient (concentration diffusion) and temperature gradient (thermodiffusion), by generating various temperature distribution around the filament by injecting voltage pulses with various wave forms. As a result, it was shown that concentration diffusion and thermodiffusion are always competing each other in ReRAM, and magnitude relation of concentration diffusion and thermodiffusion decides which reset occurs or set occurs is decided by the magnitude relation of concentration diffusion and thermodiffusion. |
Keyword |
(in Japanese) |
(See Japanese page) |
(in English) |
Resistive random access memory / ReRAM / concentration diffusion / thermodiffusion / / / / |
Reference Info. |
IEICE Tech. Rep., vol. 114, no. 360, SDM2014-132, pp. 125-128, Dec. 2014. |
Paper # |
SDM2014-132 |
Date of Issue |
2014-12-05 (EID, SDM) |
ISSN |
Print edition: ISSN 0913-5685 Online edition: ISSN 2432-6380 |
Copyright and reproduction |
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EID2014-37 SDM2014-132 Link to ES Tech. Rep. Archives: EID2014-37 SDM2014-132 |
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