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Paper Abstract and Keywords
Presentation 2015-08-10 13:40
Effects of substrate bias on properties of nitrogen-doped DLC films prepared by radio frequency plasma-enhanced chemical vapor deposition
Masato Tsuchiya, Kazuki Murakami, Tatsuhito Satou, Takahiro Takami, Yoshiharu Enta, Hideki Nakazawa (Hirosaki Univ.) CPM2015-32
Abstract (in Japanese) (See Japanese page) 
(in English) We have deposited nitrogen-doped diamond-like carbon (N-DLC) films by RF plasma-enhanced chemical vapor deposition using CH4, N2, and Ar as a dilution gas and substrate pulsed biases with different duty ratios, and investigated the structure and chemical bonding, the surface morphology, and the mechanical and electrical properties of the films. We also prepared N-DLC on P-type silicon substrate to form a hetero junction and characterized its electrical properties. We found that the increase in duty ratio caused clustering of sp2 carbon atoms in the films. On the other hand, the resistivity of the films remained almost unchanged at the order of 10-2 Ω·cm. We confirmed that the hetero junction showed rectifying characteristics, whose rectification ratio was 35.9 at ±0.5 V.
Keyword (in Japanese) (See Japanese page) 
(in English) Diamond-like carbon / Plasma-enhanced chemical vapor deposition / Nitrogen / Substrate pulsed bias / Solar cell / / /  
Reference Info. IEICE Tech. Rep., vol. 115, no. 179, CPM2015-32, pp. 7-10, Aug. 2015.
Paper # CPM2015-32 
Date of Issue 2015-08-03 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2015-08-10 - 2015-08-11 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2015-08-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Effects of substrate bias on properties of nitrogen-doped DLC films prepared by radio frequency plasma-enhanced chemical vapor deposition 
Sub Title (in English)  
Keyword(1) Diamond-like carbon  
Keyword(2) Plasma-enhanced chemical vapor deposition  
Keyword(3) Nitrogen  
Keyword(4) Substrate pulsed bias  
Keyword(5) Solar cell  
Keyword(6)  
Keyword(7)  
Keyword(8)  
1st Author's Name Masato Tsuchiya  
1st Author's Affiliation Hirosaki University (Hirosaki Univ.)
2nd Author's Name Kazuki Murakami  
2nd Author's Affiliation Hirosaki University (Hirosaki Univ.)
3rd Author's Name Tatsuhito Satou  
3rd Author's Affiliation Hirosaki University (Hirosaki Univ.)
4th Author's Name Takahiro Takami  
4th Author's Affiliation Hirosaki University (Hirosaki Univ.)
5th Author's Name Yoshiharu Enta  
5th Author's Affiliation Hirosaki University (Hirosaki Univ.)
6th Author's Name Hideki Nakazawa  
6th Author's Affiliation Hirosaki University (Hirosaki Univ.)
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Speaker Author-1 
Date Time 2015-08-10 13:40:00 
Presentation Time 20 minutes 
Registration for CPM 
Paper # CPM2015-32 
Volume (vol) vol.115 
Number (no) no.179 
Page pp.7-10 
#Pages 4 
Date of Issue 2015-08-03 (CPM) 

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