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Paper Abstract and Keywords
Presentation 2016-10-26 14:50
Formation technology of Flat Surface after Selective Epitaxial Growth on Ion-Implanted (100) Oriented Thin SOI Wafers
Kiichi Furukawa, Akinobu Teramoto, Rihito Kuroda, Tomoyuki Suwa, Keiichi Hashimoto, Shigetoshi Sugawa (Tohoku Univ.), Daisuke Suzuki, Yoichiro Chiba, Katsutoshi Ishii, Akira Shimizu, Kazuhide Hasebe (Tokyo Electron Tohoku) SDM2016-70 Link to ES Tech. Rep. Archives: SDM2016-70
Abstract (in Japanese) (See Japanese page) 
(in English) (Not available yet)
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Reference Info. IEICE Tech. Rep., vol. 116, no. 270, SDM2016-70, pp. 9-14, Oct. 2016.
Paper # SDM2016-70 
Date of Issue 2016-10-19 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
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All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee SDM  
Conference Date 2016-10-26 - 2016-10-27 
Place (in Japanese) (See Japanese page) 
Place (in English) Niche, Tohoku Univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Process Science and New Process Technology 
Paper Information
Registration To SDM 
Conference Code 2016-10-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Formation technology of Flat Surface after Selective Epitaxial Growth on Ion-Implanted (100) Oriented Thin SOI Wafers 
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1st Author's Name Kiichi Furukawa  
1st Author's Affiliation Tohoku University (Tohoku Univ.)
2nd Author's Name Akinobu Teramoto  
2nd Author's Affiliation Tohoku University (Tohoku Univ.)
3rd Author's Name Rihito Kuroda  
3rd Author's Affiliation Tohoku University (Tohoku Univ.)
4th Author's Name Tomoyuki Suwa  
4th Author's Affiliation Tohoku University (Tohoku Univ.)
5th Author's Name Keiichi Hashimoto  
5th Author's Affiliation Tohoku University (Tohoku Univ.)
6th Author's Name Shigetoshi Sugawa  
6th Author's Affiliation Tohoku University (Tohoku Univ.)
7th Author's Name Daisuke Suzuki  
7th Author's Affiliation Tokyo Electron Tohoku Limited Yamanashi Regional Office (Tokyo Electron Tohoku)
8th Author's Name Yoichiro Chiba  
8th Author's Affiliation Tokyo Electron Tohoku Limited Yamanashi Regional Office (Tokyo Electron Tohoku)
9th Author's Name Katsutoshi Ishii  
9th Author's Affiliation Tokyo Electron Tohoku Limited Yamanashi Regional Office (Tokyo Electron Tohoku)
10th Author's Name Akira Shimizu  
10th Author's Affiliation Tokyo Electron Tohoku Limited Yamanashi Regional Office (Tokyo Electron Tohoku)
11th Author's Name Kazuhide Hasebe  
11th Author's Affiliation Tokyo Electron Tohoku Limited Yamanashi Regional Office (Tokyo Electron Tohoku)
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Date Time 2016-10-26 14:50:00 
Presentation Time 25 minutes 
Registration for SDM 
Paper # SDM2016-70 
Volume (vol) vol.116 
Number (no) no.270 
Page pp.9-14 
#Pages
Date of Issue 2016-10-19 (SDM) 


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