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Paper Abstract and Keywords
Presentation 2017-10-27 13:30
Investigation of formation conditions for boron carbon nitride film by chemical vapor deposition
Maito Kosaka, Noriyuki Urakami, Yoshio Hashimoto (Shinshu Univ.) CPM2017-67
Abstract (in Japanese) (See Japanese page) 
(in English) Toward to realization of carbon-based compound semiconductors with wide energy bandgap, as a novel production method of boron carbon nitride (BCN) film, we have proposed an incorporation of B into graphite carbon nitride (g-C3N4) using chemical vapor deposition. BCN films were formed on c-plane sapphire substrate using melamine and ammonia borane powder as precursors. The substrate temperature was varied from 610 to 650 °C. B, C and N core levels from x-ray photoelectron spectroscopy were detected. Decreasing C composition and increasing B composition were achieved with the increase in the substrate temperature, indicating the incorporation of B atoms by substitution for C atoms. Optical absorptions peaks were shifted to high energy side by B incorporation, which indicates the successful formation of BCN films using melamine and ammonia borane powders as precursors.
Keyword (in Japanese) (See Japanese page) 
(in English) BCN / g-C3N4 / CVD / XPS / / / /  
Reference Info. IEICE Tech. Rep., vol. 117, no. 268, CPM2017-67, pp. 1-4, Oct. 2017.
Paper # CPM2017-67 
Date of Issue 2017-10-20 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2017-10-27 - 2017-10-28 
Place (in Japanese) (See Japanese page) 
Place (in English) Shinshu Univ. Nagano-Education Campus, E7 building 3F 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2017-10-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Investigation of formation conditions for boron carbon nitride film by chemical vapor deposition 
Sub Title (in English)  
Keyword(1) BCN  
Keyword(2) g-C3N4  
Keyword(3) CVD  
Keyword(4) XPS  
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1st Author's Name Maito Kosaka  
1st Author's Affiliation Shinshu University. (Shinshu Univ.)
2nd Author's Name Noriyuki Urakami  
2nd Author's Affiliation Shinshu University. (Shinshu Univ.)
3rd Author's Name Yoshio Hashimoto  
3rd Author's Affiliation Shinshu University. (Shinshu Univ.)
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Speaker Author-1 
Date Time 2017-10-27 13:30:00 
Presentation Time 20 minutes 
Registration for CPM 
Paper # CPM2017-67 
Volume (vol) vol.117 
Number (no) no.268 
Page pp.1-4 
#Pages 4 
Date of Issue 2017-10-20 (CPM) 

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