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Paper Abstract and Keywords
Presentation 2018-05-24 13:55
Fabrication of Cu-O Thin Films by Galvanostatic Electrochemical Deposition from Weakly Acidic Solutions
mansoureh keikhaei, Masaya Ichimura (NIT) ED2018-15 CPM2018-2 SDM2018-10
Abstract (in Japanese) (See Japanese page) 
(in English) Cu-O thin films are deposited at low pH (< 6), low and high temperatures (10?C and 60?C) using the cathodic electrochemical deposition method. The effects of the deposition current densities are studied in a range including current densities high enough to electrolyze water and generate hydrogen bubbles. The influences of deposition variables on film composition, structural, morphological and optical properties are investigated. Auger electron spectroscopy results show fabrication of both Cu2O and CuO, which is consistent with the results of Raman spectroscopy. X-ray diffraction patterns show (111) and (220) peaks related to Cu2O for the samples deposited at 60?C, whereas the samples deposited at the low temperature are almost amorphous.
Keyword (in Japanese) (See Japanese page) 
(in English) electrochemical deposition, / copper oxide / thin films / water electrolysis / / / /  
Reference Info. IEICE Tech. Rep., vol. 118, no. 58, ED2018-15, pp. 5-10, May 2018.
Paper # ED2018-15 
Date of Issue 2018-05-17 (ED, CPM, SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2018-15 CPM2018-2 SDM2018-10

Conference Information
Committee ED CPM SDM  
Conference Date 2018-05-24 - 2018-05-24 
Place (in Japanese) (See Japanese page) 
Place (in English) Toyohashi Univ. of Tech. (VBL) 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Crystal growth, characterization, and devices (compound semiconductors, Si, SiGe, opto-electrical materials), and others 
Paper Information
Registration To ED 
Conference Code 2018-05-ED-CPM-SDM 
Language English 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication of Cu-O Thin Films by Galvanostatic Electrochemical Deposition from Weakly Acidic Solutions 
Sub Title (in English)  
Keyword(1) electrochemical deposition,  
Keyword(2) copper oxide  
Keyword(3) thin films  
Keyword(4) water electrolysis  
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1st Author's Name mansoureh keikhaei  
1st Author's Affiliation Nagoya institute of technology (NIT)
2nd Author's Name Masaya Ichimura  
2nd Author's Affiliation Nagoya institute of technology (NIT)
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Speaker Author-1 
Date Time 2018-05-24 13:55:00 
Presentation Time 25 minutes 
Registration for ED 
Paper # ED2018-15, CPM2018-2, SDM2018-10 
Volume (vol) vol.118 
Number (no) no.58(ED), no.59(CPM), no.60(SDM) 
Page pp.5-10 
#Pages 6 
Date of Issue 2018-05-17 (ED, CPM, SDM) 

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