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Paper Abstract and Keywords
Presentation 2018-06-25 16:15
Concern of Ferroelectric HfO2 Films Brought by Large Coercive Field
Shinji Migita, Hiroyuki Ota (AIST), Akira Toriumi (Univ. Tokyo) SDM2018-25
Abstract (in Japanese) (See Japanese page) 
(in English) Ferroelectric HfO2-based thin films are attractive memory materials for application in LSI. These ferroelectrics have large coercive fields, 10 times larger than those of conventional ferroelectric materials. The large coercive field is advantageous for the attainment of a large memory window in ultrathin films. In another sense, however, the applied electric field for memory operation becomes close to the breakdown electric field of the film. Therefore it is important to secure robust memory properties during the cyclic voltage application.
Keyword (in Japanese) (See Japanese page) 
(in English) HfO2 / Hf-Zr-O / ferroelectric / metastable phase / endurance / coercive field / dielectric breakdown /  
Reference Info. IEICE Tech. Rep., vol. 118, no. 110, SDM2018-25, pp. 43-46, June 2018.
Paper # SDM2018-25 
Date of Issue 2018-06-18 (SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF SDM2018-25

Conference Information
Committee SDM  
Conference Date 2018-06-25 - 2018-06-25 
Place (in Japanese) (See Japanese page) 
Place (in English) Nagoya Univ. VBL3F 
Topics (in Japanese) (See Japanese page) 
Topics (in English) Material Science and Process Technology for MOS Devices and Memories 
Paper Information
Registration To SDM 
Conference Code 2018-06-SDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Concern of Ferroelectric HfO2 Films Brought by Large Coercive Field 
Sub Title (in English)  
Keyword(1) HfO2  
Keyword(2) Hf-Zr-O  
Keyword(3) ferroelectric  
Keyword(4) metastable phase  
Keyword(5) endurance  
Keyword(6) coercive field  
Keyword(7) dielectric breakdown  
Keyword(8)  
1st Author's Name Shinji Migita  
1st Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
2nd Author's Name Hiroyuki Ota  
2nd Author's Affiliation National Institute of Advanced Industrial Science and Technology (AIST)
3rd Author's Name Akira Toriumi  
3rd Author's Affiliation The University of Tokyo (Univ. Tokyo)
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Speaker Author-1 
Date Time 2018-06-25 16:15:00 
Presentation Time 20 minutes 
Registration for SDM 
Paper # SDM2018-25 
Volume (vol) vol.118 
Number (no) no.110 
Page pp.43-46 
#Pages 4 
Date of Issue 2018-06-18 (SDM) 

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