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Paper Abstract and Keywords
Presentation 2019-11-07 15:00
Annealing effects on the properties of nitrogen doped DLC films
Hiroya Osanai, Kazuki Nakamura, Haruto Koriyama, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki (Hirosaki Univ.), Maki Suemitsu (Tohoku Univ.), Hideki Nakazawa (Hirosaki Univ.) CPM2019-46
Abstract (in Japanese) (See Japanese page) 
(in English) We have prepared nitrogen doped diamond-like carbon (N-DLC) films by plasma-enhanced chemical vapor deposition using H2 as a dilution gas and investigated the effects of post-annealing in a vacuum on the film properties. We found that optical bandgap slightly increased after post-annealing at 235 to 270°C, suggesting that the density of defect levels in bandgap decreased. On the other hand, it was found that the optical bandgap decreased after post-annealing at 420 to 490°C. At these temperatures, the amount of bound hydrogen in the films tended to decrease, whereas sp2C=C bonds increased and their clustering was enhanced. We examined the current-voltage characteristics of N-DLC/p-type Si heterojunctions and found that the heterojunction annealed at 490°C exhibited the highest rectification ratio.
Keyword (in Japanese) (See Japanese page) 
(in English) Diamond-like carbon / Plasma-enhanced chemical vapor deposition / Nitrogen / Post-annealing / / / /  
Reference Info. IEICE Tech. Rep., vol. 119, no. 271, CPM2019-46, pp. 9-14, Nov. 2019.
Paper # CPM2019-46 
Date of Issue 2019-10-31 (CPM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2019-11-07 - 2019-11-08 
Place (in Japanese) (See Japanese page) 
Place (in English) Fukui univ. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2019-11-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Annealing effects on the properties of nitrogen doped DLC films 
Sub Title (in English)  
Keyword(1) Diamond-like carbon  
Keyword(2) Plasma-enhanced chemical vapor deposition  
Keyword(3) Nitrogen  
Keyword(4) Post-annealing  
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1st Author's Name Hiroya Osanai  
1st Author's Affiliation Hirosaki University (Hirosaki Univ.)
2nd Author's Name Kazuki Nakamura  
2nd Author's Affiliation Hirosaki University (Hirosaki Univ.)
3rd Author's Name Haruto Koriyama  
3rd Author's Affiliation Hirosaki University (Hirosaki Univ.)
4th Author's Name Yasuyuki Kobayashi  
4th Author's Affiliation Hirosaki University (Hirosaki Univ.)
5th Author's Name Yoshiharu Enta  
5th Author's Affiliation Hirosaki University (Hirosaki Univ.)
6th Author's Name Yushi Suzuki  
6th Author's Affiliation Hirosaki University (Hirosaki Univ.)
7th Author's Name Maki Suemitsu  
7th Author's Affiliation Tohoku University (Tohoku Univ.)
8th Author's Name Hideki Nakazawa  
8th Author's Affiliation Hirosaki University (Hirosaki Univ.)
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Speaker Author-1 
Date Time 2019-11-07 15:00:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2019-46 
Volume (vol) vol.119 
Number (no) no.271 
Page pp.9-14 
#Pages 6 
Date of Issue 2019-10-31 (CPM) 

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