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Paper Abstract and Keywords
Presentation 2022-08-04 16:15
Hydrogen gas effects on the properties of boron carbide films prepared by magnetron sputtering
Nishida Tatsuya, Taniguchi Ryu, Masayoshi Sato, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki (Hirosaki Univ.), Hirokazu Fukidome (Touhoku Univ.), Hideki Nakazawa (Hirosaki Univ.) CPM2022-15
Abstract (in Japanese) (See Japanese page) 
(in English) We have deposited amorphous boron carbide (B4C) films and hydrogenated amorphous B4C (B4C:H) films by RF magnetron sputtering without H2 and with H2, respectively, using a B4C target and investigated the effects of hydrogen on the properties of the B4C and B4C:H films. The critical loads of the B4C:H films, as obtained from scratch tests, were smaller than that of the B4C film, and the critical load of the B4C:H films increased with increasing hydrogen flow ratio. It was found that the critical load was negatively correlated with internal stress. The friction coefficient and specific wear rate of the B4C:H films tended to decrease with the hydrogen flow ratio. The optical bandgap (Eg) and resistivity of the B4C:H films were greater than those of the B4C film. As the hydrogen flow ratio increased, the Eg and resistivity of the B4C:H films increased, probably due to a decrease in sp2 C=C bonds caused by the introduction of hydrogen.
Keyword (in Japanese) (See Japanese page) 
(in English) Boron carbide / Hydrogen / Sputtering / Mechanical properties / Tribological properties / Optical bandgap / Resistivity /  
Reference Info. IEICE Tech. Rep., vol. 122, no. 147, CPM2022-15, pp. 14-17, Aug. 2022.
Paper # CPM2022-15 
Date of Issue 2022-07-28 (CPM) 
ISSN Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2022-08-04 - 2022-08-05 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2022-08-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Hydrogen gas effects on the properties of boron carbide films prepared by magnetron sputtering 
Sub Title (in English)  
Keyword(1) Boron carbide  
Keyword(2) Hydrogen  
Keyword(3) Sputtering  
Keyword(4) Mechanical properties  
Keyword(5) Tribological properties  
Keyword(6) Optical bandgap  
Keyword(7) Resistivity  
Keyword(8)  
1st Author's Name Nishida Tatsuya  
1st Author's Affiliation Hirosaki University (Hirosaki Univ.)
2nd Author's Name Taniguchi Ryu  
2nd Author's Affiliation Hirosaki University (Hirosaki Univ.)
3rd Author's Name Masayoshi Sato  
3rd Author's Affiliation Hirosaki University (Hirosaki Univ.)
4th Author's Name Yasuyuki Kobayashi  
4th Author's Affiliation Hirosaki University (Hirosaki Univ.)
5th Author's Name Yoshiharu Enta  
5th Author's Affiliation Hirosaki University (Hirosaki Univ.)
6th Author's Name Yushi Suzuki  
6th Author's Affiliation Hirosaki University (Hirosaki Univ.)
7th Author's Name Hirokazu Fukidome  
7th Author's Affiliation Touhoku University, (Touhoku Univ.)
8th Author's Name Hideki Nakazawa  
8th Author's Affiliation Hirosaki University (Hirosaki Univ.)
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Speaker Author-1 
Date Time 2022-08-04 16:15:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # CPM2022-15 
Volume (vol) vol.122 
Number (no) no.147 
Page pp.14-17 
#Pages 4 
Date of Issue 2022-07-28 (CPM) 

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