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Paper Abstract and Keywords
Presentation 2022-11-30 10:45
Mask Optimization Using Voronoi Partition and Iterative Improvement
Naoki Nonaka, Yukihide Kohira (Univ. of Aizu), Atsushi Takahashi (Tokyo Tech), Chikaaki Kodama (KIOXIA) VLD2022-41 ICD2022-58 DC2022-57 RECONF2022-64
Abstract (in Japanese) (See Japanese page) 
(in English) To realize continuously scaling down technology node, progressing manufacturing process by optical lithography is required. In resolution enhancement techniques in the optical lithography, Optical Proximity Correction (OPC), which improves shape fidelity of formed patterns on wafers to designed target patterns by mask optimization, is essential to progress the optical lithography. In this paper, we propose a mask optimization by Voronoi partition and iterative improvement. The mask region is divided by Voronoi partition and one parameter is defined for each region. The shape of mask pattern is determined by adjusting these parameters in the iterative improvement. Experiments show that the quality of the mask shape obtained by the proposed method is not degraded significantly and that the reduction of variables in the optimization reduces the execution time.
Keyword (in Japanese) (See Japanese page) 
(in English) optical lithography / mask optimization / Optical Proximity Correction (OPC) / Voronoi partition / / / /  
Reference Info. IEICE Tech. Rep., vol. 122, no. 283, VLD2022-41, pp. 127-132, Nov. 2022.
Paper # VLD2022-41 
Date of Issue 2022-11-21 (VLD, ICD, DC, RECONF) 
ISSN Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF VLD2022-41 ICD2022-58 DC2022-57 RECONF2022-64

Conference Information
Committee VLD DC RECONF ICD IPSJ-SLDM  
Conference Date 2022-11-28 - 2022-11-30 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English) Design Gaia 2022 -New Field of VLSI Design- 
Paper Information
Registration To VLD 
Conference Code 2022-11-VLD-DC-RECONF-ICD-SLDM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Mask Optimization Using Voronoi Partition and Iterative Improvement 
Sub Title (in English)  
Keyword(1) optical lithography  
Keyword(2) mask optimization  
Keyword(3) Optical Proximity Correction (OPC)  
Keyword(4) Voronoi partition  
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1st Author's Name Naoki Nonaka  
1st Author's Affiliation The University of Aizu (Univ. of Aizu)
2nd Author's Name Yukihide Kohira  
2nd Author's Affiliation The University of Aizu (Univ. of Aizu)
3rd Author's Name Atsushi Takahashi  
3rd Author's Affiliation Tokyo Institute of Technology (Tokyo Tech)
4th Author's Name Chikaaki Kodama  
4th Author's Affiliation KIOXIA Corporation (KIOXIA)
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Speaker Author-1 
Date Time 2022-11-30 10:45:00 
Presentation Time 25 minutes 
Registration for VLD 
Paper # VLD2022-41, ICD2022-58, DC2022-57, RECONF2022-64 
Volume (vol) vol.122 
Number (no) no.283(VLD), no.284(ICD), no.285(DC), no.286(RECONF) 
Page pp.127-132 
#Pages 6 
Date of Issue 2022-11-21 (VLD, ICD, DC, RECONF) 

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