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| Presentation | 2024-02-29 10:45 Fabrication and Evaluation of Aluminum Nitride Thin Film Using Microwave Plasma-Assisted Low-Temperature Atomic Layer Deposition Tomoya Takahashi, Masanori Miura, Bashir Ahmmad, Fumihiko Hirose (Yamagata Univ.)  CPM2023-99 |
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| Abstract | (in Japanese) | (See Japanese page) |
| (in English) | Aluminum nitride is expected to be used as a passivation film for devices due to its wide band gap and stability to water and oxygen. In this experiment, we investigated the optimum conditions for the deposition of aluminum nitride films by atomic layer deposition using microwave plasma and succeeded in the deposition of aluminum nitride films with about 80% of nitrogen and aluminum content. We also confirmed the transition of the composition ratio inside the film by etching for a long time, measured the film growth rate by spectroscopic ellipsometry, observed the surface structure by atomic force microscopy, and confirmed the crystallinity by X-ray diffraction. | |
| Keyword | (in Japanese) | (See Japanese page) |
| (in English) | Atomic layer deposition / microwave / aluminum nitride / / / / / | |
| Reference Info. | IEICE Tech. Rep., vol. 123, no. 395, CPM2023-99, pp. 11-14, Feb. 2024. | |
| Paper # | CPM2023-99 | |
| Date of Issue | 2024-02-22 (CPM) | |
| ISSN | Online edition: ISSN 2432-6380 | |
| Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) | |
| Download PDF | CPM2023-99 |
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| Conference Information | |
| Committee | CPM |
| Conference Date | 2024-02-29 - 2024-02-29 |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Yamagata University |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Paper Information | |
| Registration To | CPM |
| Conference Code | 2024-02-CPM |
| Language | Japanese |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication and Evaluation of Aluminum Nitride Thin Film Using Microwave Plasma-Assisted Low-Temperature Atomic Layer Deposition |
| Sub Title (in English) | |
| Keyword(1) | Atomic layer deposition |
| Keyword(2) | microwave |
| Keyword(3) | aluminum nitride |
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| 1st Author's Name | Tomoya Takahashi |
| 1st Author's Affiliation | Yamagata University (Yamagata Univ.) |
| 2nd Author's Name | Masanori Miura |
| 2nd Author's Affiliation | Yamagata University (Yamagata Univ.) |
| 3rd Author's Name | Bashir Ahmmad |
| 3rd Author's Affiliation | Yamagata University (Yamagata Univ.) |
| 4th Author's Name | Fumihiko Hirose |
| 4th Author's Affiliation | Yamagata University (Yamagata Univ.) |
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| Speaker | Author-1 |
| Date Time | 2024-02-29 10:45:00 |
| Presentation Time | 15 minutes |
| Registration for | CPM |
| Paper # | CPM2023-99 |
| Volume (vol) | vol.123 |
| Number (no) | no.395 |
| Page | pp.11-14 |
| #Pages | 4 |
| Date of Issue | 2024-02-22 (CPM) |
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