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Paper Abstract and Keywords
Presentation 2024-07-18 15:20
Fabrication and Evaluation of Aluminum Silicate Thin Films for Alkali Metal Adsorption
Hibiki Takeda, Ryo Miyazawa, Masanori Miura, Bashir Ahmmad Arima, Fumihiko Hirose (Yamagata Univ.) CPM2024-16
Abstract (in Japanese) (See Japanese page) 
(in English) In recent years, thin film application of aluminum silicate has been promoted. For aluminum silicate thin film deposition, we used plasma excited humidified argon as the oxidizing gas, TDMAS (Tris(dimethylamino)silane) as the SiO₂ source gas, and TMA (trimethylaluminum) as the Al₂O₃ source gas. A room-temperature deposition process was developed using the atomic layer deposition method, which allows composition ratio control. In this oxide film, the alkali metal adsorption and exchange capability of aluminum silicate was demonstrated. The adsorption capacity was also confirmed to vary depending on the composition ratio of Si and Al in the thin film. The method has succeeded in adsorbing Cs and Sr on aluminum silicate films, and if these thin films can be deposited on flexible substrates in the future and alkali metal adsorption/exchange using roll-to-roll equipment becomes possible, it will be possible to efficiently recover radioactive contaminants.
Keyword (in Japanese) (See Japanese page) 
(in English) Room temperature atomic layer deposition / Aluminum silicate / Alumina / Silica / Plasma excited humidified argon / / /  
Reference Info. IEICE Tech. Rep., vol. 124, no. 115, CPM2024-16, pp. 15-18, July 2024.
Paper # CPM2024-16 
Date of Issue 2024-07-11 (CPM) 
ISSN Online edition: ISSN 2432-6380
Copyright
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reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
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Conference Information
Committee CPM  
Conference Date 2024-07-18 - 2024-07-19 
Place (in Japanese) (See Japanese page) 
Place (in English)  
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2024-07-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) Fabrication and Evaluation of Aluminum Silicate Thin Films for Alkali Metal Adsorption 
Sub Title (in English)  
Keyword(1) Room temperature atomic layer deposition  
Keyword(2) Aluminum silicate  
Keyword(3) Alumina  
Keyword(4) Silica  
Keyword(5) Plasma excited humidified argon  
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Keyword(7)  
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1st Author's Name Hibiki Takeda  
1st Author's Affiliation Yamagata University (Yamagata Univ.)
2nd Author's Name Ryo Miyazawa  
2nd Author's Affiliation Yamagata University (Yamagata Univ.)
3rd Author's Name Masanori Miura  
3rd Author's Affiliation Yamagata University (Yamagata Univ.)
4th Author's Name Bashir Ahmmad Arima  
4th Author's Affiliation Yamagata University (Yamagata Univ.)
5th Author's Name Fumihiko Hirose  
5th Author's Affiliation Yamagata University (Yamagata Univ.)
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Speaker Author-1 
Date Time 2024-07-18 15:20:00 
Presentation Time 20 minutes 
Registration for CPM 
Paper # CPM2024-16 
Volume (vol) vol.124 
Number (no) no.115 
Page pp.15-18 
#Pages 4 
Date of Issue 2024-07-11 (CPM) 

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