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Chair |
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Shigeyoshi Watanabe (Shonan Inst. of Tech.) |
Vice Chair |
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Toshihiro Sugii (Fujitsu Microelectronics) |
Secretary |
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Hisahiro Anzai (Sony), Tetsuro Endo (Tohoku Univ.) |
Assistant |
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Katsunori Onishi (Kyushu Inst. of Tech.), Yukinori Ono (NTT) |
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Conference Date |
Thu, Nov 12, 2009 10:00 - 16:20
Fri, Nov 13, 2009 10:00 - 16:15 |
Topics |
Process, Device, Circuit Simulation, etc. |
Conference Place |
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Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Thu, Nov 12 AM 10:00 - 16:20 |
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10:00-10:10 |
Introductory talk ( 10 min. ) |
(1) |
10:10-11:00 |
[Invited Talk]
Low power 3D system integration by inductive coupling communications and its perspective[invited] |
Tadahiro Kuroda (Keio Univ.) |
(2) |
11:00-11:50 |
[Invited Talk]
Compact MOSFET Model and Its Perspective
-- from bulk-MOSFET to MG-MOSFET -- SDM2009-135 |
Mitiko Miura-Mattausch, Masataka Miyake, Koh Johguchi, Shunta Kusu, Kenta Ishimura, Hideyuki Kikuchihara, Feldmann Uwe, Mattausch Hans Juergen (Hiroshima Univ.) |
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11:50-13:00 |
Lunch ( 70 min. ) |
(3) |
13:00-13:40 |
[Invited Talk]
2009 SISPAD Review SDM2009-136 |
Katsuhiko Tanaka (MIRAI-Selete) |
(4) |
13:40-14:20 |
[Invited Talk]
Report on 2009 SISPAD (2) SDM2009-137 |
Matsuto Ogawa (Kobe Univ.) |
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14:20-14:40 |
Break ( 20 min. ) |
(5) |
14:40-15:05 |
Surface-Potential-Based Drain Current Model for Thin-Film Transistors SDM2009-138 |
Hiroshi Tsuji (Osaka Univ/JST), Yoshinari Kamakura, Kenji Taniguchi (Osaka Univ.) |
(6) |
15:05-15:30 |
HiSIM-IGBT: A Compact IGBT Model for Circuit Simulation SDM2009-139 |
Masataka Miyake, Hiroki Masuoka, Uwe Feldmann, Mitiko Miura-Mattausch (Hiroshima Univ.) |
(7) |
15:30-15:55 |
Development of MEMS and Equivalent Circuit Generator SDM2009-140 |
Nobuyo Fujiwara, Kazuo Asaumi (Mizuho Information & Research Institute), Tomoyuki Koike (Micromachine Center), Toshiyuki Tsuchiya (Kyoto Univ,), Gen Hashiguchi (Shizuoka Univ.) |
(8) |
15:55-16:20 |
Device Modeling and Simulation for CMOS Biosensor Applications SDM2009-141 |
Shigeyasu Uno, Kazuo Nakazato (Nagoya Univ.) |
Fri, Nov 13 AM 10:00 - 16:15 |
(9) |
10:00-10:25 |
Impact of Self-Heating Effect on the Electrical Characteristics of Nanoscale Transistors SDM2009-142 |
Yoshinari Kamakura, Nobuya Mori (Osaka Univ./JST), Kenji Taniguchi (Osaka Univ.) |
(10) |
10:25-10:50 |
R-matrix method for quantum transport simulation in atomistic modeling SDM2009-143 |
Gennady Mil'nikov, Nobuya Mori, Yoshinari Kamakura (Osaka Univ./JST) |
(11) |
10:50-11:15 |
Carrier Transport Analysis of Strained SiGe/Si-pMOSFETs using Full-band Device Simulation SDM2009-144 |
Hiroshi Takeda (NEC Electronics Corp.), Michihito Kawada (NEC Informatec Systems), Kiyoshi Takeuchi, Masami Hane (NEC Electronics Corp.) |
(12) |
11:15-11:40 |
A Novel Monte Carlo Simulation to Evaluate the Size Effect of Resistivity for Scaled Metallic Interconnects SDM2009-145 |
Takashi Kurusu, Makoto Wada, Noriaki Matsunaga, Akihiro Kajita, Hiroyoshi Tanimoto, Nobutoshi Aoki, Yoshiaki Toyoshima, Hideki Shibata (Toshiba Corp.) |
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11:40-13:00 |
Lunch ( 80 min. ) |
(13) |
13:00-13:50 |
[Tutorial Invited Lecture]
Possible Performance of SOI Devices, their Potentiality and Prospects
-- Past Constraint and Current Issues -- SDM2009-146 |
Yasuhisa Omura (Kansai Univ.) |
(14) |
13:50-14:40 |
[Invited Talk]
Random Fluctuations in Scaled MOS Devices SDM2009-147 |
Kiyoshi Takeuchi (MIRAI-Selete/NEC Corp.), Akio Nishida (MIRAI-Selete), Toshiro Hiramoto (MIRAI-Selete/Univ. of Tokyo.) |
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14:40-15:00 |
Break ( 20 min. ) |
(15) |
15:00-15:25 |
A Discrete Surface Potential Model which Accurately Reflects Channel Doping Profile and its Application to Ultra-Fast Analysis of Random Dopant Fluctuation SDM2009-148 |
Hironori Sakamoto, Hiroshi Arimoto, Hiroo Masuda, Satoshi Funayama, Shigetaka Kumashiro (MIRAI-Selete) |
(16) |
15:25-15:50 |
Atomic Scale Analysis of the Degradation Mechanism of the Integrity High-k/Metal-gate Interface Caused by the Interaction between Point-Defects and Residual Strain around the Interface SDM2009-149 |
Ken Suzuki, Yuta Itoh, Tatsuya Inoue, Hideo Miura (Tohoku Univ.), Hideki Yoshikawa, Keisuke Kobayashi (National Inst. for Materials Science), Seiji Samukawa (Tohoku Univ.) |
(17) |
15:50-16:15 |
Trial application of tight-binding method to Si-cluster surrounded by SiO2 in optimized atomistic network SDM2009-150 |
Kenji Kawabata, Takashi Ichikawa, Hiroshi Watanabe (Toshiba Corp.) |
Announcement for Speakers |
General Talk | Each speech will have 20 minutes for presentation and 5 minutes for discussion. |
Contact Address and Latest Schedule Information |
SDM |
Technical Committee on Silicon Device and Materials (SDM) [Latest Schedule]
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Contact Address |
Hisahiro Ansai(Sony)
Tel 046-201-3297 Fax046-202-6572
E-: HiAniny |
Last modified: 2009-09-28 18:12:05
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