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Technical Committee on Silicon Device and Materials (SDM) [schedule] [select]
Chair Tatsuya Kunikiyo (Renesas)
Vice Chair Takahiro Shinada (Tohoku Univ.)
Secretary Rihito Kuroda (Tohoku Univ.), Tadashi Yamaguchi (Renesas)
Assistant Hiroya Ikeda (Shizuoka Univ.)

Conference Date Tue, Jun 20, 2017 13:00 - 17:10
Topics Material Science and Process Technology for MOS Devices and Memories 
Conference Place  
Sponsors This conference is co-sponsored by The Japan Society of Applied Physics.
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and
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Tue, Jun 20 PM 
13:00 - 17:10
(1) 13:00-13:20 [Invited Lecture]
Scintillators and Ga2O3 Semiconductors SDM2017-21
Go Okada, Yuki Usui, Naoki Kawano, Noriaki Kawaguchi, Takayuki Yanagida (NAIST)
(2) 13:20-13:40 [Invited Lecture]
Development of Quantum Imaging Detector using SOI Technology
-- Looking Elementary Particles and X-rays with Semiconductor --
SDM2017-22
Yasuo Arai (KEK)
(3) 13:40-14:00 [Invited Lecture]
Studies on semiconducting gas sensors with WO3 nanoparticles for skin-emitted acetone detection SDM2017-23
Yuki Yamada, Satoshi Hiyama (NTT DOCOMO), Hitoshi Tabata (Univ. of Tokyo)
(4) 14:00-14:20 [Invited Lecture]
Sensing technologies using nitrogen-vacancy centers in diamond SDM2017-24
Takayuki Iwasaki, Mutsuko Hatano (Tokyo Inst. of Tech.)
  14:20-14:35 Break ( 15 min. )
(5) 14:35-14:55 Direct Observation of Chemical Structure and Electrical Dipole at High-k/SiO2 Interface Using by XPS Measurements SDM2017-25 Nobuyuki Fujimura, Akio Ohta, Mitsuhisa Ikeda, Katsunori Makihara, Seiichi Miyazaki (Nagoya Univ.)
(6) 14:55-15:15 Resistive Switching Properties of Si Oxide by Constant Voltage and Constant Current Application SDM2017-26 Akio Ohta, Yusuke Kato, Mitsuhisa Ikeda, Katsunori Makihara, Seiichi Miyazaki (Nagoya Univ.)
(7) 15:15-15:35 Capacitance Analyses of p-ch GaN MOS Structure on Polarization ― Junction Substrate SDM2017-27 Rumi Takayama, Takuya Hoshii (Tokyo Inst. of Tech.), Akira Nakajima (AIST), Shinichi Nishizawa (Kyushu Univ.), Hiromichi Ohashi, Kuniyuki Kakushima, Hitoshi Wakabayashi, Kazuo Tsutsui (Tokyo Inst. of Tech.)
(8) 15:35-15:55 Heavily-doped SOI Substrate and Transfer Printing for Fabrication of TMDC FETs SDM2017-28 Takamasa Kawanago, Ryo Ikoma, Hiroyuki Takagi, Shunri Oda (Tokyo Inst. of Tech.)
  15:55-16:10 Break ( 15 min. )
(9) 16:10-16:30 Low-Carrier-Density Sputtered-MoS2 Film by Vapor-Phase- Sulfurization Kentaro Matsuura, Takumi Ohashi, Iriya Muneta (Tokyo Tech), Seiya Ishihara (Meiji Univ.), Kuniyuki Kakushima, Kazuo Tsutsui (Tokyo Tech), Atsushi Ogura (Meiji Univ.), Hitoshi Wakabayashi (Tokyo Tech)
(10) 16:30-16:50 Characterization of defects in Ge1-xSnx gate stack structure SDM2017-29 Yuichi Kaneda, Shinnichi ike, Masayuki Kanematsu, Mitsuo Sakashita, Wakana Takeuchi, Osamu Nakatsuka, Shigeaki Zaima (Nagoya Univ.)
(11) 16:50-17:10 Formation of Ultrathin Crystalline Structure of Group-IV Elements on Epitaxial Ag(111) Surface SDM2017-30 Koichi Ito, Akio Ohta, Masashi Kurosawa, Masaaki Araidai, Mitsuhisa Ikeda, Katsunori Makihara, Seiichi Miyazaki (Nagoya Univ.)

Announcement for Speakers
General TalkEach speech will have 15 minutes for presentation and 5 minutes for discussion.
Invited LectureEach speech will have 15 minutes for presentation and 5 minutes for discussion.

Contact Address and Latest Schedule Information
SDM Technical Committee on Silicon Device and Materials (SDM)   [Latest Schedule]
Contact Address Rihito Kuroda(Tohoku Univ.)
Tel 022-795-4833 Fax 022-795-4834
E--mail: e3 


Last modified: 2017-04-19 17:20:55


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