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| Chair |
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Tatsuya Usami (Rapidus) |
| Vice Chair |
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Hiroya Ikeda (Shizuoka Univ.) |
| Secretary |
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Takuji Hosoi (Kwansei Gakuin Univ.), Takuya Futase (Western Digital) |
| Assistant |
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Hiroshi Okada (Toyohashi Univ. of Tech.), Taizo Sadoh (Kyushu Univ.) |
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| Conference Date |
Thu, Oct 24, 2024 10:00 - 17:00 |
| Topics |
Process Science and New Process Technology |
| Conference Place |
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Copyright
and
reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
| Registration Fee |
This workshop will be held as the IEICE workshop in fully electronic publishing. Registration fee will be necessary except the speakers and participants other than the participants to workshop(s) in non-electronic publishing. See the registration fee page. We request the registration fee or presentation fee to participants who will attend the workshop(s) on SDM. |
Thu, Oct 24 AM
10:00 - 11:40 |
| (1) |
10:00-10:40 |
[Invited Talk]
Investigation of narrow-width low-resistivity graphene interconnects |
Takashi Matsumoto (TEL) |
| (2) |
10:40-11:00 |
Development of Area Selective Deposition of Dielectric film on Metal/Low-k with Inhibitor Passivation  SDM2024-43 |
Shinichi Ike, Yumiko Kawano, Shuji Azumo, Yusaku Kashiwagi (TTS) |
| (3) |
11:00-11:20 |
Defect Reduction in UV Nanoimprint Lithography
-- Fast filling process with CO2 gas -- SDM2024-44 |
Toshiki ITO (Canon) |
| (4) |
11:20-11:40 |
Measurement and analysis of gas concentration distribution in vacuum chamber using high-speed and high-SNR absorption imaging system SDM2024-45 |
Yushi Sakai, Takafumi Inada, Takezo Mawaki, Tomoyuki Suwa, Tatsuo Morimoto, Yasuyuki Shirai, Shigetoshi Sugawa, Rihito Kuroda (Tohoku Univ.) |
| |
11:40-13:00 |
Lunch ( 80 min. ) |
Thu, Oct 24 PM
13:00 - 14:20 |
| (1) |
13:00-13:40 |
SDM2024-46 |
|
| (2) |
13:40-14:20 |
[Invited Talk]
Growth of High-Quality Poly-Crystal Semiconductor Films on Insulator SDM2024-47 |
Ryu Hashimoto, Takashi Kajiwara, Kenta Moto, Keisuke Yamamoto (Kyushu Univ.), Tatsuya Okada, Takashi Noguchi (Univ. of Ryukyus), Taizoh Sadoh (Kyushu Univ.) |
| |
14:20-14:30 |
Break ( 10 min. ) |
Thu, Oct 24 PM
14:30 - 15:30 |
| (3) |
14:30-14:50 |
Investigation of Ferroelectric HfNx Formation on Si(100) Substrates by Two-Step Deposition Method SDM2024-48 |
Kaimu Hamada, Kangbai Li, Shun-ichiro Ohmi (Tokyo Tech) |
| (4) |
14:50-15:10 |
Investigation of post-metallization annealing condition on the ferroelectric HfN1.15 thin film formation SDM2024-49 |
Kangbai Li, Shun-ichiro Ohmi (Tokyo Tech.) |
| (5) |
15:10-15:30 |
Surface Orientation Dependence of Ga2O3 Thin Films on Sapphire Substrates Prepared by RF Sputtering SDM2024-50 |
Takumi Morita, Fuminobu Imaizumi (NIT, Oyama College) |
| |
15:30-15:40 |
Break ( 10 min. ) |
Thu, Oct 24 PM
15:40 - 17:00 |
| (6) |
15:40-16:20 |
[Memorial Lecture]
Demonstration of Recovery Annealing on 7-Bits per Cell 3D Flash Memory at Cryogenic Operation for Bit Cost Scalability and Sustainability SDM2024-51 |
Yuta Aiba, Hitomi Tanaka, Fumie Kikushima, Hiroki Tanaka, Fujisawa Toshio, Tomoya Sanuki (kioxia) |
| (7) |
16:20-16:40 |
Statistical Capacitance Measurement of Si Trench Capacitor Using Impedance Measurement Platform SDM2024-52 |
Ryoya Nishimaki, Koga Saito, Takezo Mawaki, Rihito Kuroda (Tohoku Univ.) |
| (8) |
16:40-17:00 |
Impedance Measurement Platform Toward Statistical Capacitance and Current Characteristic Measurements of 3D Integration Devices SDM2024-53 |
Koga Saito, Ryoya Nishimaki, Takezo Mawaki, Rihito Kuroda (Tohoku Univ.) |
| Announcement for Speakers |
| General Talk | Each speech will have 15 minutes for presentation and 5 minutes for discussion. |
| Invited Talk | Each speech will have 30 minutes for presentation and 10 minutes for discussion. |
| Contact Address and Latest Schedule Information |
| SDM |
Technical Committee on Silicon Device and Materials (SDM) [Latest Schedule]
|
| Contact Address |
※各研究会幹事もしくは担当者の連絡先を記載してください。 |
Last modified: 2024-10-21 09:53:54
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