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All Technical Committee Conferences (Searched in: All Years)
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Search Results: Conference Papers |
Conference Papers (Available on Advance Programs) (Sort by: Date Descending) |
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Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM, ICD |
2013-08-01 09:50 |
Ishikawa |
Kanazawa University |
Scaling Strategy for Low Power RF Applications with Multi Gate Oxide Dual Work function (DWF) MOSFETs Utilizing Self-Aligned Integration Scheme Toshitaka Miyata, Shigeru Kawanaka, Akira Hokazono, Tatsuya Ohguro, Yoshiaki Toyoshima (TOSHIBA) SDM2013-67 ICD2013-49 |
Dual Work Function (DWF)-MOSFET of 100 nm gate length device with self-aligned integration scheme was demonstrated utili... [more] |
SDM2013-67 ICD2013-49 pp.13-18 |
SDM, ICD |
2011-08-25 10:50 |
Toyama |
Toyama kenminkaikan |
Plasma Doping and Laser Spike Annealing Technique for Steep SDE Formation in nano-scale MOSFET Emiko Sugizaki, Toshitaka Miyata, Yasunori Oshima, Akira Hokazono, Kanna Adachi, Kiyotaka Miyano, Hideji Tsujii, Shigeru Kawanaka, Satoshi Inaba, Takaharu Itani, Toshihiko Iinuma, Yoshiaki Toyoshima (Toshiba) SDM2011-75 ICD2011-43 |
The importance of impurity profile design for Source/Drain Extension (SDE) is widely recognized for deeply scaled MOSFET... [more] |
SDM2011-75 ICD2011-43 pp.23-27 |
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