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Committee Date Time Place Paper Title / Authors Abstract Paper #
ED, SDM 2010-07-01
11:10		 Tokyo Tokyo Inst. of Tech. Ookayama Campus [Invited Talk] Stress and Surface Orientation Engineering in Scaled CMOSFETs Considering High-Field Carrier Transport
Masumi Saitoh, Yukio Nakabayashi (Toshiba), Ken Uchida (Tokyo Inst. of Tech.), Toshinori Numata (Toshiba) ED2010-79 SDM2010-80		 We present the systematic study on the performance of short-channel and strained (100) and (110) n/pMOSFETs. Saturation ... [more] ED2010-79 SDM2010-80
pp.125-129
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