IEICE Technical Report

Print edition: ISSN 0913-5685      Online edition: ISSN 2432-6380

Volume 115, Number 19

Organic Molecular Electronics

Workshop Date : 2015-04-29 - 2015-04-30 / Issue Date : 2015-04-22

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Table of contents

OME2015-1
In Situ Observation of Direct Electron Transfer Reaction of Cytochrome c Immobilized on ITO Electrode Modified with Phosphoric Acid Compounds by Slab Optical Waveguide Spectroscopy
Naoki Matsuda, Hirotaka Okabe, Toshihiko Nagamura (AIST)
pp. 1 - 5

OME2015-2
Chemical modification of diamond powder with optically active functionalities and its chiral recognition behavior
Takako Nakamura, Tsuguyori Ohana, Tetsuo Tsuchiya (AIST), Toshiki Tsubota (Kyushu Inst. Tech.)
pp. 7 - 10

OME2015-3
Coordination chemistry of active center of metalloenzyme studied by affinity capillary electrophoresis
Nobuhiko Iki, Yosuke Sato (Tohoku Univ.)
pp. 11 - 14

OME2015-4
Glycolytic oscillations and their synchronization in yeast cells encapsulated in microparticles
Takashi Amemiya, Kouhei Obase, Naoki Hiramatsu (YNU), Kenichi Shibata (Toyo Univ), Kiminori Itoh (YNU)
pp. 15 - 16

OME2015-5
High Refractive Index and High Abbe Number Hybrid Material
Okihiro Sugihara (Utsunomiya Univ.), Bin Cai (Univ. Shanghai Sci. Tech.), Toshikuni Kaino (Tohoku Univ.)
pp. 17 - 19

OME2015-6
[Invited Talk] Photochemical up-conversion by non-coherent light and utilization of surface plasmon resonance
Toshihiko Nagamura (AIST, Kitakyushu Col. Technol.), Kenji Takehara, Hirokazu Yamane (Kitakyushu Col. Technol.), Hideki Kawai (Shizuoka Univ.), Naoki Matsuda (AIST)
pp. 21 - 24

OME2015-7
[Invited Talk] Suppression of light induced degradation of a-Si solar cells by eliminating clusters
Masaharu Shiratani, Susumu Toko, Yoshihiro Torigoe, Kimitaka Keya, Kazunori Koga (Kyushu Univ.)
pp. 25 - 30

OME2015-8
Effect of fluorine in In-Ga-Zn-O on defect passivartion and reliability of thin-film transistors
Mamoru Furuta, Jingxin Jiang, Gengo Tatsuoka, Dapeng Wang (Kochi Univ. of Tech.)
pp. 31 - 34

OME2015-9
[Invited Talk] Formation of high Sn content SiSn films and its band structure -- Aiming for direct-band-gap semiconductor --
Masashi Kurosawa, Wakana Takeuchi, Mitsuo Sakashita, Osamu Nakatsuka, Shigeaki Zaima (Nagoya Univ.)
pp. 35 - 37

OME2015-10
Lateral solid-phase crystallization of a-GeSn on insulator for next generation flexible electronics
Ryo Matsumura (Kyushu Univ./ JSPS), Hironori Chikita, Yuki Kai, Masaya Sasaki, Taizoh Sadoh, Hiroshi Ikenoue, Masanobu Miyao (Kyushu Univ.)
pp. 39 - 40

OME2015-11
Influence of TEOS-SiO2 cap layer on Au induced lateral crystallization for amorphous Ge on insulator
Kazuki Kudo, Kinta Kusano, Takatsugu Sakai (KNCT), Shinichi Motoyama, Yutaka Kusuda, Masahiro Furuta (SAMCO), Nobuyuki Naka, Tomoko Numata (HORIBA), Kenichiro Takakura, Isao Tsunoda (KNCT)
pp. 41 - 44

OME2015-12
Low temperature formation of orientation controlled crystalline Ge/Au/insulator stacked structure
Tatsushi Nomitsu, Hayato Okamoto, Kohei Kudo, Taisei Sakaguchi, Kenichiro Takakura, Isao Tsunoda (KNCT)
pp. 45 - 48

OME2015-13
Grain Growth Control by Atmospheric Pressure Micro-Thermal-Plasma-Jet Irradiation on Amorphous Silicon Strips and High-Speed Operation of CMOS Circuit
Seiji Morisaki, Shohei Hayashi, Shogo Yamamoto, Taichi Nakatani, Seiichiro Higashi (Hiroshima Univ.)
pp. 49 - 52

OME2015-14
Temperature Analysis of Si Films during Blue Multi-Laser Diode Annealing
Tatsuya Okada, Seita Kamimura, Takashi Noguchi (Univ. Ryukyus)
pp. 53 - 55

OME2015-15
Low Resistivity of poly-Si films by LA Laser Annealing
Takashi Noguchi, Tatsuya Okada (Univ. Ryukyus)
pp. 57 - 61

OME2015-16
Self-Aligned Four-Terminal Planar Metal Double-Gate CLC LT Poly-Si TFTs on Glass Substrate
Hiroki Ohsawa, Shun Sasaki, Akito Hara (Tohoku Gakuin Univ.)
pp. 63 - 66

OME2015-17
[Tutorial Lecture] An introduction to Corning's Advanced Glass Technologies
Taketsugu Itoh (Corning)
pp. 67 - 70

Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan