Online edition: ISSN 2432-6380
[TOP] | [2018] | [2019] | [2020] | [2021] | [2022] | [2023] | [2024] | [Japanese] / [English]
SDM2024-43
Development of Area Selective Deposition of Dielectric film on Metal/Low-k with Inhibitor Passivation
Shinichi Ike, Yumiko Kawano, Shuji Azumo, Yusaku Kashiwagi (TTS)
pp. 1 - 4
SDM2024-44
Defect Reduction in UV Nanoimprint Lithography
-- Fast filling process with CO2 gas --
Toshiki ITO (Canon)
pp. 5 - 9
SDM2024-45
Measurement and analysis of gas concentration distribution in vacuum chamber using high-speed and high-SNR absorption imaging system
Yushi Sakai, Takafumi Inada, Takezo Mawaki, Tomoyuki Suwa, Tatsuo Morimoto, Yasuyuki Shirai, Shigetoshi Sugawa, Rihito Kuroda (Tohoku Univ.)
pp. 10 - 13
SDM2024-46
(See Japanese page.)
pp. 14 - 17
SDM2024-47
[Invited Talk]
Growth of High-Quality Poly-Crystal Semiconductor Films on Insulator
Ryu Hashimoto, Takashi Kajiwara, Kenta Moto, Keisuke Yamamoto (Kyushu Univ.), Tatsuya Okada, Takashi Noguchi (Univ. of Ryukyus), Taizoh Sadoh (Kyushu Univ.)
pp. 18 - 21
SDM2024-48
Investigation of Ferroelectric HfNx Formation on Si(100) Substrates by Two-Step Deposition Method
Kaimu Hamada, Kangbai Li, Shun-ichiro Ohmi (Tokyo Tech)
pp. 22 - 25
SDM2024-49
Investigation of post-metallization annealing condition on the ferroelectric HfN1.15 thin film formation
Kangbai Li, Shun-ichiro Ohmi (Tokyo Tech.)
pp. 26 - 28
SDM2024-50
Surface Orientation Dependence of Ga2O3 Thin Films on Sapphire Substrates Prepared by RF Sputtering
Takumi Morita, Fuminobu Imaizumi (NIT, Oyama College)
pp. 29 - 32
SDM2024-51
[Memorial Lecture]
Demonstration of Recovery Annealing on 7-Bits per Cell 3D Flash Memory at Cryogenic Operation for Bit Cost Scalability and Sustainability
Yuta Aiba, Hitomi Tanaka, Fumie Kikushima, Hiroki Tanaka, Fujisawa Toshio, Tomoya Sanuki (kioxia)
p. 33
SDM2024-52
Statistical Capacitance Evaluation of Si Trench Capacitor Using Impedance Measurement Platform
Ryoya Nishimaki, Koga Saito, Takezo Mawaki, Rihito Kuroda (Tohoku Univ.)
pp. 34 - 37
SDM2024-53
Impedance Measurement Platform Toward Statistical Capacitance and Current Characteristic Measurements of 3D Integration Devices
Koga Saito, Ryoya Nishimaki, Takezo Mawaki, Rihito Kuroda (Tohoku Univ.)
pp. 38 - 41
Note: Each article is a technical report without peer review, and its polished version will be published elsewhere.