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Paper Abstract and Keywords
Presentation 2012-05-18 13:50
H2O2 treatment of the Cu2O thin films deposited by the electrochemical method
Ying Song, Masaya Ichimura (Nagoya Inst. of Tech.) ED2012-35 CPM2012-19 SDM2012-37
Abstract (in Japanese) (See Japanese page) 
(in English) Cu2O is considered to be promising as an absorber layer material of solar cells, but its band gap is larger than the optimum one. Therefore, we attempted to oxidize Cu2O using H2O2 to increase oxygen ratio and decrease band gap. Cu2O thin films were deposited on indium-tin-oxide-coated glass from an aqueous solution containing CuSO4, lactic acid and KOH by the galvanostatic electrochemical deposition at 40ºC with current density of -1mA/cm2. Then, the as-prepared copper oxide thin film was dipped in H2O2 (30%) at 90ºC to oxidize for 10, 20 or 30 minutes. By the H2O2 treatment, the oxygen content was increased, and the band gap was decreased.
Keyword (in Japanese) (See Japanese page) 
(in English) Cu2O thin film / H2O2 treatment / photo-absorption / composition ratio / / / /  
Reference Info. IEICE Tech. Rep., vol. 112, no. 33, CPM2012-19, pp. 91-94, May 2012.
Paper # CPM2012-19 
Date of Issue 2012-05-10 (ED, CPM, SDM) 
ISSN Print edition: ISSN 0913-5685    Online edition: ISSN 2432-6380
Copyright
and
reproduction		 All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)
Download PDF ED2012-35 CPM2012-19 SDM2012-37

Conference Information
Committee ED SDM CPM  
Conference Date 2012-05-17 - 2012-05-18 
Place (in Japanese) (See Japanese page) 
Place (in English) VBL, Toyohashi Univ. of Technol. 
Topics (in Japanese) (See Japanese page) 
Topics (in English)  
Paper Information
Registration To CPM 
Conference Code 2012-05-ED-SDM-CPM 
Language Japanese 
Title (in Japanese) (See Japanese page) 
Sub Title (in Japanese) (See Japanese page) 
Title (in English) H2O2 treatment of the Cu2O thin films deposited by the electrochemical method 
Sub Title (in English)  
Keyword(1) Cu2O thin film  
Keyword(2) H2O2 treatment  
Keyword(3) photo-absorption  
Keyword(4) composition ratio  
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1st Author's Name Ying Song  
1st Author's Affiliation Nagoya Institute of Technology (Nagoya Inst. of Tech.)
2nd Author's Name Masaya Ichimura  
2nd Author's Affiliation Nagoya Institute of Technology (Nagoya Inst. of Tech.)
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Speaker Author-1 
Date Time 2012-05-18 13:50:00 
Presentation Time 25 minutes 
Registration for CPM 
Paper # ED2012-35, CPM2012-19, SDM2012-37 
Volume (vol) vol.112 
Number (no) no.32(ED), no.33(CPM), no.34(SDM) 
Page pp.91-94 
#Pages 4 
Date of Issue 2012-05-10 (ED, CPM, SDM) 

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