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Technical Committee on Component Parts and Materials (CPM)  (Searched in: 2013)

Search Results: Keywords 'from:2013-11-28 to:2013-11-28'

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Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Ascending)
 Results 1 - 20 of 27  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM, LQE, ED 2013-11-28
10:35
Osaka   High-Power Operation and Applications of InGaN Laser Diode
Hiroyuki Hagino, Katsuya Samonji, Shinji Yoshida, Shinichi Takigawa, Kiyoshi Morimoto, Toshiyuki Takizawa, Hideki Kasugai, Kazuhiko Yamanaka, Takuma Katayama (Panasonic) ED2013-64 CPM2013-123 LQE2013-99
We have developed the watt-class blue-violet laser diode array for the applications to data projector and automotive lig... [more] ED2013-64 CPM2013-123 LQE2013-99
pp.1-4
CPM, LQE, ED 2013-11-28
11:00
Osaka   Texture formation by anisotropic dry etching of m-plane GaN, and light extraction efficiency improvement of textured m-plane GaN LED
Toshiyuki Fujita, Atsushi Yamada, Akira Inoue, Ryo Kato, Toshiya Yokokawa (Panasonic) ED2013-65 CPM2013-124 LQE2013-100
 [more] ED2013-65 CPM2013-124 LQE2013-100
pp.5-9
CPM, LQE, ED 2013-11-28
11:25
Osaka   Study on improvement of the light extraction efficiency in 350-nm-emission UV-LED
Tsubasa Nakashima, Kenichiro Takeda, Motoaki Iwaya, Satoshi Kamiyama, Tetsuya Takeuchi, Isamu Akasaki (Meijo Univ.), Hiroshi Amano (Nagoya Univ.) ED2013-66 CPM2013-125 LQE2013-101
We have aimed to improve the light extraction efficiency by using p- and n- high-reflectivity indium tin oxide /Al elect... [more] ED2013-66 CPM2013-125 LQE2013-101
pp.11-16
CPM, LQE, ED 2013-11-28
11:50
Osaka   Bow management of substrate for nitride semiconductor devices by internally focused laser processing -- application to silicon substrate --
Natsuko Aota, Hideo Aida, Hidetoshi Takeda (Namiki Precision Jewel) ED2013-67 CPM2013-126 LQE2013-102
Bow management for heteroepitaxy of III-Nitride films on silicon substrate has been required, as substrate bow is introd... [more] ED2013-67 CPM2013-126 LQE2013-102
pp.17-20
CPM, LQE, ED 2013-11-28
13:30
Osaka   Electrical properties of Si/SiC heterojunctions fabricated using surface-activated bonding
Shota Nishida, Jianbo Liang, Masashi Morimoto, Naoteru Shigekawa (Osaka City Univ.), Manabu Arai (New Japan Radio) ED2013-68 CPM2013-127 LQE2013-103
The physical and electrical properties of p+-Si/n-4H-SiC heterojunctions with and without being annealed fabricated by u... [more] ED2013-68 CPM2013-127 LQE2013-103
pp.21-25
CPM, LQE, ED 2013-11-28
13:55
Osaka   Fabrication of Tandem Solar Cells by Using Surface-Activated Bonding
Jianbo Liang (Osaka City Univ.), Shota Nishida, Masashi Morimoto, Naoteru Shigekawa (Osaka City University) ED2013-69 CPM2013-128 LQE2013-104
 [more] ED2013-69 CPM2013-128 LQE2013-104
pp.27-30
CPM, LQE, ED 2013-11-28
14:20
Osaka   Investigation on the optimum MQW structure for InGaN/GaN solar cells
Noriyuki Watanabe, Manabu Mitsuhara, Haruki Yokoyama (NTT), Jianbo Liang, Naoteru Shigekawa (Osaka City Univ.) ED2013-70 CPM2013-129 LQE2013-105
We have investigated InGaN/GaN MQW solar cells on the relationship between short circuit current and the MQW structure. ... [more] ED2013-70 CPM2013-129 LQE2013-105
pp.31-34
CPM, LQE, ED 2013-11-28
14:45
Osaka   Characterization of low-carrier thick n-GaN Schottky diodes on GaN free-standing substrates
Kenji Shiojima, Yuhei Kihara, Toshichika Aoki (Univ. of Fukui), Naoki Kaneda, Tomoyoshi Mishima (Hitachi Metal) ED2013-71 CPM2013-130 LQE2013-106
We fabricated and characterized low-Si-doped thick GaN Schottky diodes on GaN substrates with varied C-doping concentrat... [more] ED2013-71 CPM2013-130 LQE2013-106
pp.35-38
CPM, LQE, ED 2013-11-28
15:10
Osaka   AC Operation of Low-Mg-Doped p-GaN Schottky Diodes
Kenji Shiojima, Toshichika Aoki (Univ. of Fukui), Naoki Kaneda, Tomoyoshi Mishima (Hitachi Metal) ED2013-72 CPM2013-131 LQE2013-107
Current-voltage (I-V) characteristics with variations of voltage sweep speed (vsweep) and changing sweep directions, and... [more] ED2013-72 CPM2013-131 LQE2013-107
pp.39-42
CPM, LQE, ED 2013-11-28
15:50
Osaka   Quantum Efficiency of p-GaN with NEA surface for high brightness electron source
Takuya Maekawa, Yoshio Honda, Hiroshi Amano, Tomohiro Nishitani (Nagoya Univ.) ED2013-73 CPM2013-132 LQE2013-108
We report the lifetime and high brightness condition of the NEA GaN surface for the high brightness and durability of th... [more] ED2013-73 CPM2013-132 LQE2013-108
pp.43-46
CPM, LQE, ED 2013-11-28
16:15
Osaka   Study on C doping in GaN and AlGaN by MOVPE
Yuya Wakasugi, Yoshio Honda, Hiroshi Amano (Nagoya Univ.) ED2013-74 CPM2013-133 LQE2013-109
We grew Mg/C co-doped GaN and AlGaN by MOVPE for identifying the C level in GaN and AlGaN. We measured electrical and op... [more] ED2013-74 CPM2013-133 LQE2013-109
pp.47-50
CPM, LQE, ED 2013-11-28
16:40
Osaka   A novel method for crystallizations of aluminum nitride
PeiTsen Wu, Mitsuru Funato, Yoichi Kawakami (Kyoto Univ.) ED2013-75 CPM2013-134 LQE2013-110
In this work, a new method of AlN crystal growth is proposed. AlN powders, whiskers, and films have successfully been sy... [more] ED2013-75 CPM2013-134 LQE2013-110
pp.51-55
CPM, LQE, ED 2013-11-28
17:05
Osaka   Fabrication of the multi-junction GaInN based solar cells using tunnel junction
Hironori Kurokawa, Tomomi Goda, Mitsuru Kaga, Motoaki Iwaya, Tetsuya Takeuchi, Satoshi Kamiyama (Meijo Univ.), Isamu Akasaki (Meijo Univ./Nagoya Univ.), Hiroshi Amano (Nagoya Univ.) ED2013-76 CPM2013-135 LQE2013-111
 [more] ED2013-76 CPM2013-135 LQE2013-111
pp.57-61
CPM, LQE, ED 2013-11-29
09:30
Osaka   OMVPE growth and red luminescence properties of Eu doped GaN/AlGaN multiple quantum well structures
Takanori Arai, Ryuta Wakamatsu, Dong-gun Lee, Atsushi Koizumi, Yasufumi Fujiwara (Osaka Univ.) ED2013-77 CPM2013-136 LQE2013-112
We have grown Eu-doped GaN/AlGaN multiple quantum well (MQW:Eu) structures by organometallic vapor-phase epitaxy, and in... [more] ED2013-77 CPM2013-136 LQE2013-112
pp.63-66
CPM, LQE, ED 2013-11-29
09:55
Osaka   Deep-level transient spectroscopy study on defect levels in Eu,Si-codoped GaN grown by organometallic vapor phase epitaxy
Souichirou Kuwata, Atsushi Koizumi, Yasufumi Fujiwara (Osaka Univ.) ED2013-78 CPM2013-137 LQE2013-113
 [more] ED2013-78 CPM2013-137 LQE2013-113
pp.67-70
CPM, LQE, ED 2013-11-29
10:20
Osaka   Growth of thick InGaN epilayer by high-pressure MOVPE
Kouhei Yamashita, Yoshio Honda, Masahito Yamaguchi, Hiroshi Amano (Nagoya Univ.)
 [more]
CPM, LQE, ED 2013-11-29
11:00
Osaka   Growth of GaN with thin 3C-SiC buffer layer on Si(111) substrate
Masayoshi Katagiri, Kenta Izumi, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.), Hidehiko Oku, Hidetoshi Asamura, Keisuke Kawamura (Air Water R&D) ED2013-79 CPM2013-138 LQE2013-114
Since GaN is desired for optical and electronic devices, therefore reduction of substrate cost is very important topic. ... [more] ED2013-79 CPM2013-138 LQE2013-114
pp.71-74
CPM, LQE, ED 2013-11-29
11:25
Osaka   Annealing in N2-CO of AlN buffer layers on sapphire and high temperature growth of AlN layers by MOVPE
Gou Nishio, Shuhei Suzuki, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.), Hiroyuki Fukuyama (Tohoku Univ.) ED2013-80 CPM2013-139 LQE2013-115
AlN has attracted attention for applications in the deep ultraviolet region, because of its wide direct band-gap and exc... [more] ED2013-80 CPM2013-139 LQE2013-115
pp.75-78
CPM, LQE, ED 2013-11-29
11:50
Osaka   Control of nucleation for AlN growth on 6H-SiC substrate by low-pressure HVPE
Shin Kitagawa, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.) ED2013-81 CPM2013-140 LQE2013-116
Aluminum nitride (AlN) has a direct bandgap energy of 6.2 eV, which is the largest bandgap energy among III-V semiconduc... [more] ED2013-81 CPM2013-140 LQE2013-116
pp.79-82
CPM, LQE, ED 2013-11-29
13:30
Osaka   Development of Highly-Uniform 270-nm Deep-Ultraviolet Light-Emitting Diodes
Takuya Mino (Riken/Panasonic), Hideki Hirayama (Riken), Norimichi Noguchi, Takayoshi Takano, Kenji Tsubaki (Riken/Panasonic) ED2013-82 CPM2013-141 LQE2013-117
High-quality AlN templates were successfully fabricated on sapphire substrates by using a 2-inchx3 metallorganic vapor p... [more] ED2013-82 CPM2013-141 LQE2013-117
pp.83-86
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