|
Chair |
|
Tatsuya Kunikiyo (Renesas) |
Vice Chair |
|
Takahiro Shinada (Tohoku Univ.) |
Secretary |
|
Rihito Kuroda (Tohoku Univ.), Tadashi Yamaguchi (Renesas) |
Assistant |
|
Hiroya Ikeda (Shizuoka Univ.) |
|
Conference Date |
Wed, Oct 26, 2016 14:00 - 16:50
Thu, Oct 27, 2016 10:00 - 14:40 |
Topics |
Process Science and New Process Technology |
Conference Place |
Niche, Tohoku Univ. |
Address |
6-6-10, Aza-Aoba, Aramaki, Aoba-ku, Sendai 980-8579, Japan |
Contact Person |
Rihito Kuroda, Tohoku University |
Copyright and reproduction |
All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034) |
Wed, Oct 26 PM 14:00 - 16:50 |
(1) |
14:00-14:50 |
[Invited Talk]
Controlling Metallic Contamination in Advanced ULSI Processing SDM2016-69 |
Koichiro Saga (Sony) |
(2) |
14:50-15:15 |
Formation technology of Flat Surface after Selective Epitaxial Growth on Ion-Implanted (100) Oriented Thin SOI Wafers SDM2016-70 |
Kiichi Furukawa, Akinobu Teramoto, Rihito Kuroda, Tomoyuki Suwa, Keiichi Hashimoto, Shigetoshi Sugawa (Tohoku Univ.), Daisuke Suzuki, Yoichiro Chiba, Katsutoshi Ishii, Akira Shimizu, Kazuhide Hasebe (Tokyo Electron Tohoku) |
|
15:15-15:30 |
Break ( 15 min. ) |
(3) |
15:30-16:10 |
[Invited Talk]
Back-Bias Control Technique for Suppression of Die-to-Die Delay Variability of SOTB CMOS Circuits at Ultralow-Voltage (0.4 V) Operation SDM2016-71 |
Hideki Makiyama, Yoshiki Yamamoto, Takumi Hasegawa, Shinobu Okanishi, Keiichi Maekawa, Hiroki Shinkawata, Shiro Kamohara, Yasuo Yamaguchi (Renesas Electronics Corp.), Nobuyuki Sugii (Hitach), Koichiro Ishibashi (The Univ. of Electro-Communications), Tomoko Mizutani, Toshiro Hiramoto (The Univ. of Tokyo) |
(4) |
16:10-16:50 |
[Invited Talk]
Ultralow-Voltage Operation of Silicon-on-Thin-BOX (SOTB) 2Mbit SRAM Down to 0.37 V Utilizing Adaptive Back Bias SDM2016-72 |
Yoshiki Yamamoto, Hideki Makiyama, Takumi Hasegawa, Shinobu Okanishi, Keiichi Maekawa, Shinkawata Hiroki, Shiro Kamohara, Yasuo Yamaguchi (Renesas), Nobuyuki Sugii (Hitachi), Tomoko Mizutani, Toshiro Hiramoro (UT) |
Wed, Oct 26 PM 16:50 - 16:50 |
Thu, Oct 27 AM 10:00 - 14:40 |
(5) |
10:00-10:25 |
Effects of the oxidizing species on the interface of Al2O3 film by atomic layer deposition SDM2016-73 |
Masaya Saito, Tomoyuki Suwa, Akinobu Teramoto, Rihito Kuroda, Yasumasa Koda, Hisaya Sugita, Hidekazu Ishii, Yoshinobu Shiba, Yasuyuki Shirai, Shigetoshi Sugawa (Tohoku univ.), Marie Hayashi, Junichi Tsuchimoto (CANON ANELVA) |
(6) |
10:25-10:50 |
A Study on Pentacene Film Formation on SiO2 with Wet Process for Bottom-Contact Type OFETs SDM2016-74 |
Yasutaka Maeda, Mizuha Hiroki, Shun-ichiro Ohmi (Tokyo Tech.) |
(7) |
10:50-11:15 |
Behavior of Random Telegraph Noise toward Bias Voltage Changing SDM2016-75 |
Takezo Mawaki, Akinobu Teramoto, Rihito Kuroda, Shinya Ichino, Tetsuya Goto, Tomoyuki Suwa, Shigetoshi Sugawa (Tohoku Univ.) |
(8) |
11:15-11:40 |
Effect of Si surface flatness on electrical characteristics of Hf-based MONOS structure SDM2016-76 |
Sohya Kudoh, Shun-ichiro Ohmi (Tokyo Tech) |
|
11:40-13:00 |
Lunch ( 80 min. ) |
(9) |
13:00-13:50 |
[Invited Talk]
Novel Pixel Structure with Stacked Deep Photodiode to Achieve High NIR Sensitivity and High MTF SDM2016-77 |
Hiroki Takahashi, Hiroshi Tanaka, Masahiro Oda, Mitsuyoshi Ando, Naoto Niisoe (TPSCo), Shinichi Kawai, Takuya Asano, Mitsugu Yoshita, Tohru Yamada (PSCS) |
(10) |
13:50-14:40 |
[Invited Talk]
Low-Noise Imaging Techniques for Scientific CMOS Image Sensors SDM2016-78 |
Min-Woong Seo, Shoji Kawahito (Shizuoka Univ.) |
Announcement for Speakers |
General Talk | Each speech will have 20 minutes for presentation and 5 minutes for discussion. |
Contact Address and Latest Schedule Information |
SDM |
Technical Committee on Silicon Device and Materials (SDM) [Latest Schedule]
|
Contact Address |
Rihito Kuroda(Tohoku Univ.)
Tel 022-795-4833 Fax 022-795-4834
E-: e3 |
Last modified: 2016-08-19 13:11:18
|
Notification: Mail addresses are partially hidden against SPAM.
|