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Technical Committee on Component Parts and Materials (CPM)  (Searched in: 2010)

Search Results: Keywords 'from:2010-10-28 to:2010-10-28'

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Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Ascending)
 Results 1 - 20 of 20  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
CPM 2010-10-28
13:00
Nagano   Characteristic of Potassium niobate/Barium titanate composites
Ryousuke Usui, Noriko Bamba (Shinshu Univ.) CPM2010-91
Potassium niobate (KN)/ barium titanate (BT) composites were fabricated
by normal sintering in order to improve water-r... [more]
CPM2010-91
pp.1-5
CPM 2010-10-28
13:25
Nagano   Growth of potassium tantalate single crystal by the directional solidification method
Takayuki Takenaka, Noriko Bamba, Keigo Hoshikawa (Shinshu Univ.) CPM2010-92
Growth of potassium tantalite (KT) single crystal by Vertical Bridgman
(VB) method is tried in this research. VB method... [more]
CPM2010-92
pp.7-11
CPM 2010-10-28
13:50
Nagano   Structure and magnetic properties of SBA-15 with magnetic metal
Yoshihiro Shinohara, Tetsuji Haeiwa (Shinshu Univ.) CPM2010-93
In this report, the metallic particle is developed in fine pores of SBA-15 with the nonelectrolyte plating, and because ... [more] CPM2010-93
pp.13-17
CPM 2010-10-28
14:15
Nagano   Magnetic properties of TbFeCo films with Au underlayer for perpendicular magnetic recording
Songtian Li, Xiaoxi Liu, Akimitsu Morisako (Shinshu Univ.) CPM2010-94
 [more] CPM2010-94
pp.19-22
CPM 2010-10-28
14:50
Nagano   Preparation of ZnO Nanowires by Ultrasonic Spray Pyrolysis -- Effect of Solvent on Crystal Morphology --
Myo Than Htay, Hiroshi Yasumatsu, Takanori Tanaka, Yoshio Hashimoto (Shinshu Univ.) CPM2010-95
The possibility of controlling the crystal morphology of ZnO nanowires by Ultrasonic Spray Pyrolysis technique has been ... [more] CPM2010-95
pp.23-26
CPM 2010-10-28
15:15
Nagano   Characterization of CuMO2 films grown by reactive sputtering
Tsubasa Ogawa, Takuya Yokomoto, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.)
 [more]
CPM 2010-10-28
15:40
Nagano   Fabrication and Evaluation C2O3/(Cr1-xAlx)2O3 Layered Thin Film
Yutaka Yonebayashi, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.)
 [more]
CPM 2010-10-28
16:05
Nagano   Preparation of CaFeOx and SrFeOx thin films on SrTiO3(100) Substrates
Kento Norota, Hiroshi Yamamoto, Nobuyuki Iwata, Takuya Nemoto (Nihon Univ)
 [more]
CPM 2010-10-28
16:40
Nagano   Structure and electric properties of RF-sputtered p-type nickel oxide thin films
Atsushi Nagata, Kazuo Uchida, Atsushi Koizumi, Hiroshi Ono, Shinji Nozaki (UEC) CPM2010-96
NiOx as a transparent oxide semiconductor has been known long to show an intrinsic p-type conductivity although most of ... [more] CPM2010-96
pp.27-31
CPM 2010-10-28
17:05
Nagano   Formation of SrAl2O4:Eu, Dy thin films by combined the Unbalanced Magnetron Sputtering and the Facing Target Sputtering Method
Takashi Kuno, Minoru Saito, Kazuaki Kobayashi, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.) CPM2010-97
In order to examine deposition rate and characteristics of thin films,SrAl2O4 : Eu2+,Dy3+ thin films was attempted by po... [more] CPM2010-97
pp.33-37
CPM 2010-10-28
17:30
Nagano   Fluorine-free tungsten deposition by metal-chloride-reduction chemical vapor deposition
Takehito Watanabe, Akira Shibata, Kensaku Kanomata, Takahiko Suzuki, Fumihiko Hirose (Yamagata Univ.) CPM2010-98
(To be available after the conference date) [more] CPM2010-98
pp.39-42
CPM 2010-10-29
09:00
Nagano   Low temperature growth of SiC films by HW-CVD using graphite filaments
Yuya Sakaguchi, Hironori Nakamura, Jun Arima, Kazuhisa Moriyama, Rinpei Hayashibe, Katsuya Abe (Shinshu Univ.) CPM2010-99
Silicon carbide films were prepared on p-Si(001) and glass substrates by hot-wire chemical vapor deposition
using grap... [more]
CPM2010-99
pp.43-46
CPM 2010-10-29
09:25
Nagano   Estimation of nitride layer thickness and characterization of the interface between SiC and nitride layer prepared by direct nitridation
Shinichiro Suzuki, Yusuke Murata, Mitsunori Henmi, Tomohiko Yamakami, Rinpei Hayashibe, Kiichi Kamimura (Shinshu Univ.) CPM2010-100
A nitride layer was formed on a SiC surface by direct nitridation in N$_{2}$ or NH$_{3}$. The surface was characterized ... [more] CPM2010-100
pp.47-50
CPM 2010-10-29
09:50
Nagano   Estimation of interface state density at nitride/SiC interface using current-voltage characteristics of MIS Schottky contact
Yusuke Murata, Shinichiro Suzuki, Shohei Kobayashi, Tomohiko Yamakami, Rinpei Hayashibe, Kiichi Kamimura (Shinshu Univ.) CPM2010-101
The nitride film was formed by direct nitridation with NH$_3$ on n type 4H-SiC to form an MIS Schottky diode. Ideality f... [more] CPM2010-101
pp.51-54
CPM 2010-10-29
10:25
Nagano   Optimization of GaN film growth condition using pulse-mode hot-mesh CVD
Kazuki Nagata, Souichi Satomoto (Nagaoka Univ. Technol.), Hironori Katagiri, Kazuo Jimbo (Nagaoka Techni. College), Maki Suemitsu, Tetsuo Endoh, Takashi Ito (Tohoku Univ. Technol.), Hideki Nakazawa (Hirosaki Univ.), Yuzuru Narita (Yamagata Univ.), Kanji Yasui (Nagaoka Univ. Technol.) CPM2010-102
Hot-mesh CVD with pulse-mode gas supply has been investigated to improve the crystallinity and optical properties of gal... [more] CPM2010-102
pp.55-58
CPM 2010-10-29
10:50
Nagano   Preparation of Cu2ZnSnS4 Thin Film for solar cell -- Effect of Precursors and Sulfurization conditions --
Myo Than Htay, Yasuyoshi Kando, Yoshio Hashimoto (Shinshu Univ.) CPM2010-103
Cu$_2$ZnSnS$_4$ thin films have been prepared by sulfurization of stacked precursor of metal/sulfide compounds (Cu, ZnS,... [more] CPM2010-103
pp.59-63
CPM 2010-10-29
11:15
Nagano   Examination of the Mg-Cu Thin Films by Alternate Layer Deposition
Takeru Shimizu, Toshiro Tannai, Hiroaki Matsui, Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami (Niigata Univ.) CPM2010-104
In order to examine the relations between the microstructure of the Mg-Cu thin films before hydrogen absorption and swit... [more] CPM2010-104
pp.65-69
CPM 2010-10-29
11:50
Nagano   Examination of ITO Thin Films Deposited at Low-tempurature for OLEDs by Sputtering Method
Yohei Nakamura, Chang Liu, Hidehiko Shimizu, Haruo Iwano, Yasuo Fukushima, Kotaro Nagata (Niigata Univ.), Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2010-105
In order to examine problems of the ITO films deposited at the low-temperature, the ITO films was deposited at the low-t... [more] CPM2010-105
pp.71-75
CPM 2010-10-29
12:15
Nagano   Preparation of two layers Organic Thin Film using Alq3/PEDOT by spin coat
Hina Chujo, Atsushi Noda, Nobuyuki Iwata, Hiroshi Yamamoto (Nihon Univ.) CPM2010-106
 [more] CPM2010-106
pp.77-80
CPM 2010-10-29
12:40
Nagano   Effects of Deposition Morphology of EL Phosphor on ZnO Nanorods on Characteristics of Lateral DCEL Devices
Tomomasa Satoh, Yuki Matuzawa, Takaki Kaneshiro, Takashi Hirate (Kanagawa Univ.) CPM2010-107
In an inorganic lateral DC-electroluminescence (DCEL) device combined with conductive ZnO nanorods(NRs), ZnS:Mn as EL ph... [more] CPM2010-107
pp.81-86
 Results 1 - 20 of 20  /   
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