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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| MW, ICD | 2019-03-14 10:55 |
Okinawa | A study on millimeter wave complex permittivity evaluations by the circular empty cavity method for photosensitive insulator Kouhei Takahagi (Utsunomiya Univ.), Kazuaki Ebisawa (TOK), Yoshinori Kogami, Takashi Shimizu (Utsunomiya Univ.)  MW2018-158 ICD2018-102 |
It is necessary to evaluate a complex permittivity of thin dielectric samples for compact and low-profile microwave and ... [more] | MW2018-158 ICD2018-102 pp.13-18 |
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| LQE, CPM, ED | 2017-12-01 10:55 |
Aichi | Nagoya Inst. tech. | Achievement of AlGaN deep-UV LED using photonic crystal(PhC)
-- Achievement of high-EQE(10%) AlGaN deep-UV LED using highly-reflective PhC on p-contact layer -- Yukio Kashima (Marubun), Noritoshi Maeda (RIKEN), Eriko Matsuura (Marubun), Masafumi Jo (RIKEN), Takeshi Iwai, Toshiro Morita (TOK), Mitsunori Kokubo, Takaharu Tashiro (TOSHIBA MACHINE), Ryuichiro Kamimura, Yamato Osada (ULVAC), Yuichi Kurashima, Hideki Takagi (AIST), Hideki Hirayama (RIKEN) ED2017-60 CPM2017-103 LQE2017-73 |
[more] | ED2017-60 CPM2017-103 LQE2017-73 pp.55-60 |
| SDM | 2017-10-25 16:00 |
Miyagi | Niche, Tohoku Univ. | Nanoscale conformal doping technology by spin on diffusion source Tetsuro Kinoshita, Shunichi Mashita, Takuya Ohashi, Yoshihiro Sawada, Yohei Kinoshita, Satoshi Fujimura (TOK) SDM2017-53 |
We developed a coating material which can form nanoscale conformal film on the wafer with 3D structure. In this study, c... [more] | SDM2017-53 pp.21-24 |
| LQE, ED, CPM | 2014-11-27 14:05 |
Osaka | The micro machining process technology of nano imprint and dry etching to improve the efficiency of nitride LED Yukio Kashima, Eriko Matsuura (Marubun), Satoshi Shimatani (TOK), Mitsunori Kokubo, Takaharu Tashiro, Takafumi Ookawa (Toshiba Machine), Ryuichiro Kamimura, Yamato Osada (ULVAC), Sachie Fujikawa, Hideki Hirayama (RIKEN) ED2014-79 CPM2014-136 LQE2014-107 |
We fabricated the photonic crystal in nitride LED and improved the light extraction efficiency. We also introduce the mi... [more] | ED2014-79 CPM2014-136 LQE2014-107 pp.27-32 |
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| LQE, ED, CPM | 2014-11-27 14:55 |
Osaka | Fabrication of high-quality AlN buffer layer for deep-UV LEDs grown on wet chemical etched patterned sapphire substrate Yuya Kanazawa, Shiro Toyoda, Issei Ohshima (Saitama Univ./RIKEN), Norihiko Kamata (Saitama Univ.), Yukio Kashima (Marubun), Eriko Matsuura (MARUBUN), Satoshi Shimatani (TOK), Mitsunori Kokubo, Takaharu Tashiro (TOSHIBA MACHINE), Takashi Ohkawa, Ryuichiro Kamimura, Yamato Osada (ULVAC), Hideki Hirayama (RIKEN) ED2014-81 CPM2014-138 LQE2014-109 |
[more] | ED2014-81 CPM2014-138 LQE2014-109 pp.39-44 |
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| OME | 2008-09-30 16:20 |
Hyogo | Gate Structure Dependence of Organic Field Effect Transistor Fabricated by Wet Process Yohei Hirose, Hirotake Kajii (Osaka Univ.), Kohki Tamura (Tokyo Ohka), Yutaka Ohmori (Osaka Univ.) OME2008-49 |
The gate structure dependence of organic field-effect transistors (OFETs) using poly [(9, 9-dialkylfluorene - 2, 7 - dyi... [more] | OME2008-49 pp.33-36 |
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| OME | 2007-09-20 16:10 |
Hyogo | KARC, NICT | Study on interfaces between insulator and active layer, and between active layer and electrodes in n-type organic field effect transistor Shohei Fukuda, Hirotake Kajii (Osaka Univ.), Toshiyuki Ogata, Motoki Takahashi (Tokyo Ohka), Yutaka Ohmori (Osaka Univ.) OME2007-29 |
The interface effects of insulator/active layer and active layer/electrode in solution-processed n-type organic field-ef... [more] | OME2007-29 pp.33-37 |
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