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Technical Committee on Silicon Device and Materials (SDM)  (Searched in: 2012)

Search Results: Keywords 'from:2012-04-27 to:2012-04-27'

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Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Ascending)
 Results 1 - 19 of 19  /   
Committee Date Time Place Paper Title / Authors Abstract Paper #
SDM, OME 2012-04-27
13:00
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. [Invited Talk] Development of Organic Photovoltaic Cell Based on Small Molecules
Tetsuya Taima (kanazawa Univ.) SDM2012-1 OME2012-1
Organic photovoltaic cells are candidate for next generation solar cells. Organic photovoltaic cells are fabricated by w... [more] SDM2012-1 OME2012-1
pp.1-4
SDM, OME 2012-04-27
13:30
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. [Invited Talk] Preparation of Organic-Inorganic Hybrid Materials and Photonic Applications
Okihiro Sugihara (Tohoku Univ.) SDM2012-2 OME2012-2
 [more] SDM2012-2 OME2012-2
pp.5-8
SDM, OME 2012-04-27
14:00
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Fabrication and Performance of Organic Solar Cells Using Hole-transporting Amorphous Molecular Materials with High Charge Carrier Mobility
Hiroshi Kageyama (Univ. Ryukyus), Yutaka Ohmori (Osaka Univ.), Yasuhiko Shirota (Fukui Univ. Technol.) SDM2012-3 OME2012-3
Organic planar solar cells (OSCs) using amorphous molecular materials with high hole-drift mobilities, tris[4-(2-thienyl... [more] SDM2012-3 OME2012-3
pp.9-13
SDM, OME 2012-04-27
14:20
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. In situ observation of adsorption process and functionality of cytochrome c on solid/liquid interfaces -- Slab optical waveguide absorption spectroscopy in UV-visible region --
Naoki Matsuda, Hirotaka Okabe (AIST)
 [more]
SDM, OME 2012-04-27
14:40
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Effects of Guided Filament Formation in NiO-ReRAM Utilizing Bio Nano Process -- Control of defects in thin films --
Mutsunori Uenuma, Takahiko Ban, Zheng Bin, Ichiro Yamashita, Yukiharu Uraoka (NAIST) SDM2012-4 OME2012-4
Controllable positioning of conductive filament in resistive memory is demonstrated using gold nanoparticles (GNPs). A G... [more] SDM2012-4 OME2012-4
pp.15-20
SDM, OME 2012-04-27
15:10
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. [Invited Talk] Growth of Silicon and Silicon-Germanium Thin Films on Glass Substrates by Continuous-Wave Laser Lateral Crystallization
Kuninori Kitahara (Shimane Univ.), Akito Hara (Tohoku Gakuin Univ.) SDM2012-5 OME2012-5
Flow-shaped growth of Si and SiGe thin films on glass substrate was achieved by continuous wave laser lateral crystalliz... [more] SDM2012-5 OME2012-5
pp.21-26
SDM, OME 2012-04-27
15:40
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. [Invited Talk] Formation of Biaxially-Oriented Poly-Si Thin Films by Double-Line Beam Continuous-Wave Laser Lateral Crystallization for High-Performance TFT
Shin-Ichiro Kuroki (Tohoku Univ.) SDM2012-6 OME2012-6
Poly-Si thin films with large crystal grains of 20×2μm2 were fabricated by continuous-wave laser lateral crystallization... [more] SDM2012-6 OME2012-6
pp.27-32
SDM, OME 2012-04-27
16:10
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Control of Crystallization Behavior of Silicon Thin Films by Semiconductor Blue-Multi-Diode-Laser Annealing
Katsuya Shirai, Jean de Dieu Mugiraneza, Toshiharu Suzuki, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) SDM2012-7 OME2012-7
 [more] SDM2012-7 OME2012-7
pp.33-36
SDM, OME 2012-04-27
16:30
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Crystallization of Si Thin Film on Poly-Imide Substrate by Semiconductor Blue Multi-Laser Diode Annealing
Tatsuya Okada, Jean de Dieu Mugiraneza, Katsuya Shirai, Toshiharu Suzuki, Takashi Noguchi (Univ. Ryukyus), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) SDM2012-8 OME2012-8
Crystallization of a-Si films on polyimide substrate was achieved using Blue Multi-Laser Diode Annealing. Surface roughn... [more] SDM2012-8 OME2012-8
pp.37-39
SDM, OME 2012-04-27
16:50
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Self-Aligned Planar Metal Double-Gate Polycrystalline-Silicon Thin-Film Transistors Fabricated at Low Temperature on Glass Substrate
Hiroyuki Ogata, Kenji Ichijo, Kenji Kondo, Yasunori Okabe, Yusuke Shika, Shinya Kamo, Akito Hara (Tohoku Gakuin Univ.) SDM2012-9 OME2012-9
A multigate polycrystalline-silicon (poly-Si) thin-film transistor (TFT) is one of the recent topics in the field of Si ... [more] SDM2012-9 OME2012-9
pp.41-44
SDM, OME 2012-04-27
17:10
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Bottom Gate TFT using Low Temperature Deposited Nanocrystalline-Si
Asuka Syuku, Eiji Takahashi, Yasunori Andoh (Nissin Electric) SDM2012-10 OME2012-10
Thin film transistors (TFTs) with nanocrystalline silicon (nc-Si) films which were directly deposited on substrate at 15... [more] SDM2012-10 OME2012-10
pp.45-48
SDM, OME 2012-04-28
09:00
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. [Invited Talk] Low-Temperature Crystallization of Amorphous Semiconductor Films Using Only Soft X-ray Irradiation
Naoto Matsuo, Akira Heya, Takayasu Mochizuki, Shuji Miyamoto, Kazuhiro Kanda (Univ Hyogo) SDM2012-11 OME2012-11
 [more] SDM2012-11 OME2012-11
pp.49-54
SDM, OME 2012-04-28
09:30
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. [Invited Talk] Excimer laser induced super lateral growth of a-Ge film
Wenchang Yeh (Shimane Univ.) SDM2012-12 OME2012-12
 [more] SDM2012-12 OME2012-12
pp.55-59
SDM, OME 2012-04-28
10:00
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Seed-less melting growth of Ge(Si) on Insulator -- Large grain formation by Si segregation --
Ryusuke Kato, Masashi Kurosawa, Hiroyuki Yokoyama, Taizoh Sadoh, Masanobu Miyao (Kyushu Univ.) SDM2012-13 OME2012-13
 [more] SDM2012-13 OME2012-13
pp.61-62
SDM, OME 2012-04-28
10:20
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Epitaxial Growth of Silicon Films on Porous Silicon Underlayer by Micro-Thermal-Plasma-Jet Irradiation
Shohei Hayashi, Ryohei Matsubara, Yuji Fujita, Mitsuhisa Ikeda, Seiichiro Higashi (Hiroshima Univ.) SDM2012-14 OME2012-14
Amorphous silicon (a-Si) film on porous silicon (PS) underlayer were melted and rapid solidification was induced by micr... [more] SDM2012-14 OME2012-14
pp.63-66
SDM, OME 2012-04-28
10:50
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Control of Grain Growth Using Amorphous Si Strips and Slit Masks Induced by Micro-Thermal-Plasma-Jet Crystallization
Yuji Fujita, Shohei Hayashi, Seiichiro Higashi (Hiroshima Univ.) SDM2012-15 OME2012-15
Lateral grain growth was induced by micro-thermal-plasma-jet (μ-TPJ) irradiation to slit masks on amorphous silicon (a-S... [more] SDM2012-15 OME2012-15
pp.67-70
SDM, OME 2012-04-28
11:10
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Orientation-Controlled Large-Grain Ge on Insulator by Au-Induced Layer Exchange Crystallization with Interfacial Oxide Layer
Tsuneharu Suzuki, Jong-Hyeok Park, Masashi Kurosawa, Masanobu Miyao, Taizoh Sadoh (Kyushu Univ.) SDM2012-16 OME2012-16
A technique for low-temperature (< ~350oC) formation of orientation-controlled large-grain Ge films on insulating layers... [more] SDM2012-16 OME2012-16
pp.71-73
SDM, OME 2012-04-28
11:30
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Electrical Characterization of SiO2 and SiN Films Deposited by RF Sputtering
Keisuke Yagi, Tatsuya Okada, Takashi Noguchi (Univ.Ryukyus) SDM2012-17 OME2012-17
SiO2 and SiN films of 100 nm thickness were deposited on the Si substrate by RF sputtering. After thermal annealing, at ... [more] SDM2012-17 OME2012-17
pp.75-77
SDM, OME 2012-04-28
11:50
Okinawa Okinawa-Ken-Seinen-Kaikan Bldg. Crystallization of the Sputtered P-doped Si Films for High Performance Poly-Si TFT
Takuma Nishinohara, J. D. Mugiraneza, Katsuya Shirai, Toshiharu Suzuki, Tatsuya Okada, Takashi Noguchi (Univ. of the Ryukyus), Tadashi Ohachi (Doshisha Univ.), Hideki Matsushima, Takao Hashimoto, Yoshiaki Ogino, Eiji Sahota (Hitachi CP) SDM2012-18 OME2012-18
After performing BLDA for phosphorus-doped Si films deposited by sputtering using Ne gas, the crystallinity of the films... [more] SDM2012-18 OME2012-18
pp.79-82
 Results 1 - 19 of 19  /   
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