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Technical Committee on Electron Devices (ED)  (Searched in: 2012)

Search Results: Keywords 'from:2012-05-17 to:2012-05-17'

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Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Ascending)
 Results 1 - 20 of 24  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
ED, SDM, CPM 2012-05-17
13:00
Aichi VBL, Toyohashi Univ. of Technol. [Invited Talk] Formation of One-Dimensionally Self-Aligned Si-based Quantum Dots and Its Application to Light Emitting Diodes
Katsunori Makihara (Nagoya Univ.), Mitsuhisa Ikeda (Hiroshima Univ.), Seiichi Miyazaki (Nagoya Univ.) ED2012-17 CPM2012-1 SDM2012-19
Self-aligned Si quantum dots (Si-QDs) have been successfully fabricated on ultrathin SiO2 by controlling low-pressure ch... [more] ED2012-17 CPM2012-1 SDM2012-19
pp.1-6
ED, SDM, CPM 2012-05-17
13:40
Aichi VBL, Toyohashi Univ. of Technol. Improvement in crystalline quality of GaAsN alloy by high temperature growth
Futoshi Fukami, Noriyuki Urakami, Hiroto Sekiguchi, Hiroshi Okada, Akihiro Wakahara (Toyohashi Univ. Tech.) ED2012-18 CPM2012-2 SDM2012-20
GaAsN alloys are one of the attractive candidates for the active layers of the luminescence devices on Si. Compared with... [more] ED2012-18 CPM2012-2 SDM2012-20
pp.7-10
ED, SDM, CPM 2012-05-17
14:05
Aichi VBL, Toyohashi Univ. of Technol. Electrical properties of n- and p-type AlGaPN for dislocation-free light-emitting devices on Si substrate
Hironari Ito, Keisuke Kumagai, Hiroto Sekiguchi, Hiroshi Okada, Akihiro Wakahara (Toyohashi Univ. of Tech.) ED2012-19 CPM2012-3 SDM2012-21
AlGaPN alloys are expected as a cladding layer for Si based monolithic laser structure in optoelectronic integrated circ... [more] ED2012-19 CPM2012-3 SDM2012-21
pp.11-14
ED, SDM, CPM 2012-05-17
14:30
Aichi VBL, Toyohashi Univ. of Technol. Polarization properties in InGaN/GaN multiple quantum well on semipolar (1-101)GaN/Si
Maki Kushimoto, Tomoyuki Tanikawa, Yoshio Honda, Masahito Yamaguchi, Hiroshi Amano (Nagoya Univ.) ED2012-20 CPM2012-4 SDM2012-22
We grew High-quality semipolar (1-101) GaN stripes on a Si substrate through Selective area growth (SAG) and regrow InGa... [more] ED2012-20 CPM2012-4 SDM2012-22
pp.15-18
ED, SDM, CPM 2012-05-17
14:55
Aichi VBL, Toyohashi Univ. of Technol. Growth-rate dependence of GaP structure grown Si substrates using metalorganic vapor phase epitaxy
Tatsuya Takagi, Shunshin Ka, Ryo Miyahara, Yasushi Takano (Shizuoka Univ.) ED2012-21 CPM2012-5 SDM2012-23
GaP layers were grown on 2° and 4° misoriented Si substrates using metalorganic vapor phase epitaxy. GaP was deposited a... [more] ED2012-21 CPM2012-5 SDM2012-23
pp.19-23
ED, SDM, CPM 2012-05-17
15:30
Aichi VBL, Toyohashi Univ. of Technol. A Surface-stress Sensor Based on a MEMS Fabry-Perot Interferometer for Label-free Protein Detection
Kazuhiro Takahashi, Hiroki Oyama, Nobuo Misawa, Koichi Okumura, Makoto Ishida, Kazuaki Sawada (Toyohashi Tech.) ED2012-22 CPM2012-6 SDM2012-24
We have newly developed a label-free protein sensor based on a MEMS Fabry-Perot interferometer integrated with a photodi... [more] ED2012-22 CPM2012-6 SDM2012-24
pp.25-28
ED, SDM, CPM 2012-05-17
15:55
Aichi VBL, Toyohashi Univ. of Technol. Fabrication and transmit-receive characteristics of ultrasonic transducers array using epitaxial PZT thin films on γ-Al2O3/Si substrates
Katsuya Ozaki, Masato Nishimura, Keisuke Suzuki, Yasuyuki Numata (Toyohashi tech.), Nagaya Okada (Honda Electronics), Daisuke Akai, Makoto Ishida (Toyohashi tech.) ED2012-23 CPM2012-7 SDM2012-25
 [more] ED2012-23 CPM2012-7 SDM2012-25
pp.29-33
ED, SDM, CPM 2012-05-17
16:20
Aichi VBL, Toyohashi Univ. of Technol. Fabrication of portable hydrogen sensors based on photochemically deposited SnO2 thin films
Dengbaoleer Ao, Yukihisa Moriguchi, Masaya Ichimura (Nagoya Inst. of Tech.Univ) ED2012-24 CPM2012-8 SDM2012-26
We fabricated highly sensitive room temperature hydrogen sensors based on doped and undoped SnO2 films by the photochemi... [more] ED2012-24 CPM2012-8 SDM2012-26
pp.35-38
ED, SDM, CPM 2012-05-17
16:45
Aichi VBL, Toyohashi Univ. of Technol. Preparation and evaluation of Ga2O3 oxygen sensors
Masaaki Isai, Takahiro Yamamoto, Takuma Tori (Shizuoka Univ.) ED2012-25 CPM2012-9 SDM2012-27
Abstract Recently, from a point of environmental problems, oxygen gas sensors attract attention of controlling the exha... [more] ED2012-25 CPM2012-9 SDM2012-27
pp.39-42
ED, SDM, CPM 2012-05-18
09:00
Aichi VBL, Toyohashi Univ. of Technol. High Open Circuit Voltage Gain in Vertical InGaAs Channel Metal-Insulator-Semiconductor Field-Effect Transistor Using Heavily Doped Drain Region and Narrow Channel Mesa
Masashi Kashiwano, Jun Hirai, Shunsuke Ikeda, Motohiko Fujimatsu, Yasuyuki Miyamoto (TITech) ED2012-26 CPM2012-10 SDM2012-28
We fabricated a vertical metal-insulator-semiconductor feld-effect transistor (MISFET) with a heterostructure launcher a... [more] ED2012-26 CPM2012-10 SDM2012-28
pp.43-48
ED, SDM, CPM 2012-05-18
09:25
Aichi VBL, Toyohashi Univ. of Technol. Interface characterization of GaN-based MOS heterostructures employing ICP-etched AlGaN surfaces
Zenji Yatabe, Yujin Hori, Sungsik Kim, Tamotsu Hashizume (Hokkaido Univ.) ED2012-27 CPM2012-11 SDM2012-29
Our aim is to investigate the effects of dry etching of AlGaN surface on interface properties of GaN-based MOS structure... [more] ED2012-27 CPM2012-11 SDM2012-29
pp.49-52
ED, SDM, CPM 2012-05-18
09:50
Aichi VBL, Toyohashi Univ. of Technol. Evaluation of GaN substrates for vertical GaN power device applications
Tetsu Kachi, Tsutomu Uesugi (Toyota RDL) ED2012-28 CPM2012-12 SDM2012-30
 [more] ED2012-28 CPM2012-12 SDM2012-30
pp.53-56
ED, SDM, CPM 2012-05-18
10:25
Aichi VBL, Toyohashi Univ. of Technol. Electrical Property of n-type GaPN:S Grown by Alternately N Supplied Organometallic Vapor Phase Epitaxy
Yuya Nagamoto, Katsuhiko Matsuoka, Hiroto Sekiguchi, Hiroshi Okada, Akihiro Wakahara (TUT) ED2012-29 CPM2012-13 SDM2012-31
 [more] ED2012-29 CPM2012-13 SDM2012-31
pp.57-61
ED, SDM, CPM 2012-05-18
10:50
Aichi VBL, Toyohashi Univ. of Technol. Low temperature crystallization of SiC films by metal induced growth technique
Katsuya Abe, Ryohei Ushikusa, Yuya Sakaguchi, Takuu Syu, Tomohiko Yamakami (Shinshu Univ.) ED2012-30 CPM2012-14 SDM2012-32
 [more] ED2012-30 CPM2012-14 SDM2012-32
pp.63-66
ED, SDM, CPM 2012-05-18
11:15
Aichi VBL, Toyohashi Univ. of Technol. Characterization of recombination centers in p-type 4H-SiC induced by low-energy electron irradiation
Kazuki Yoshihara, Masashi Kato, Masaya Ichimura (NIT), Tomoaki Hatayama (NAIST), Takeshi Ohshima (JAEA) ED2012-31 CPM2012-15 SDM2012-33
Silicon carbide (SiC) is a promising material for high power devices with low energy loss. However we have never complet... [more] ED2012-31 CPM2012-15 SDM2012-33
pp.67-72
ED, SDM, CPM 2012-05-18
11:40
Aichi VBL, Toyohashi Univ. of Technol. Growth and characterization of strained Ge epitaxial layers on SiGe substrates
Takashi Yamaha, Osamu Nakatsuka (Nagoya Univ.), Kyoichi Kinoshita, Shinichi Yoda (JAXA), Shigeaki Zaima (Nagoya Univ.) ED2012-32 CPM2012-16 SDM2012-34
 [more] ED2012-32 CPM2012-16 SDM2012-34
pp.73-77
ED, SDM, CPM 2012-05-18
13:00
Aichi VBL, Toyohashi Univ. of Technol. Influences of Crystal Structure and Orientation on Band Offsets at the CdS/Cu2ZnSnS4 Interface by First Principles Study
Wujisiguleng Bao, Masaya Ichimura (Nagoya Inst. of Tech) ED2012-33 CPM2012-17 SDM2012-35
Cu2ZnSnS4 (CZTS) has attracted much attention recently as an absorber layer material in a heterojunction solar cell. Usi... [more] ED2012-33 CPM2012-17 SDM2012-35
pp.79-83
ED, SDM, CPM 2012-05-18
13:25
Aichi VBL, Toyohashi Univ. of Technol. Electrodeposition of Ga2O3 Thin Films from Aqueous Gallium Sulfate Solutions
Junie Jhon M. Vequizo, Masaya Ichimura (Nagoya Inst. of Tech.) ED2012-34 CPM2012-18 SDM2012-36
Gallium oxide (Ga2O3) thin films were prepared by employing facile electrodeposition technique from aqueous gallium sulf... [more] ED2012-34 CPM2012-18 SDM2012-36
pp.85-89
ED, SDM, CPM 2012-05-18
13:50
Aichi VBL, Toyohashi Univ. of Technol. H2O2 treatment of the Cu2O thin films deposited by the electrochemical method
Ying Song, Masaya Ichimura (Nagoya Inst. of Tech.) ED2012-35 CPM2012-19 SDM2012-37
Cu2O is considered to be promising as an absorber layer material of solar cells, but its band gap is larger than the opt... [more] ED2012-35 CPM2012-19 SDM2012-37
pp.91-94
ED, SDM, CPM 2012-05-18
14:15
Aichi VBL, Toyohashi Univ. of Technol. Characterization of Local Electronic Transport and Electronic Emission Properties of Pillar-Shaped Si Nanostructures
Daichi Takeuchi, Katsunori Makihara (Nagoya Univ.), Mitsuhisa Ikeda (Hiroshima Univ.), Seiichi Miyazaki (Nagoya Univ.), Hirokazu Kaki, Tsukasa Hayashi (NISSIN ELECTRIC Co. Ltd.) ED2012-36 CPM2012-20 SDM2012-38
 [more] ED2012-36 CPM2012-20 SDM2012-38
pp.95-98
 Results 1 - 20 of 24  /  [Next]  
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