IEICE Technical Committee Submission System
Conference Schedule
Online Proceedings
[Sign in]
Tech. Rep. Archives
    [Japanese] / [English] 
( Committee/Place/Topics  ) --Press->
 
( Paper Keywords:  /  Column:Title Auth. Affi. Abst. Keyword ) --Press->

Technical Committee on Electron Devices (ED)  (Searched in: 2011)

Search Results: Keywords 'from:2011-11-17 to:2011-11-17'

[Go to Official ED Homepage (Japanese)] 
Search Results: Conference Papers
 Conference Papers (Available on Advance Programs)  (Sort by: Date Ascending)
 Results 1 - 20 of 27  /  [Next]  
Committee Date Time Place Paper Title / Authors Abstract Paper #
LQE, ED, CPM 2011-11-17
10:05
Kyoto Katsura Hall,Kyoto Univ. AlN/GaN Short-Period Superlattice Coherently Grown on 6H-SiC (0001) Substrates by Molecular-Beam Epitaxy
Ryosuke Kikuchi, Hironori Okumura, Tsunenobu Kimoto, Jun Suda (Kyoto Univ.) ED2011-73 CPM2011-122 LQE2011-96
Recently, we have successfully reduced the threading dislocation density in AlN layer on SiC substrates to 10$^8$ cm$^{-... [more] ED2011-73 CPM2011-122 LQE2011-96
pp.1-4
LQE, ED, CPM 2011-11-17
10:30
Kyoto Katsura Hall,Kyoto Univ. Control of interlayer on MOVPE growth of AlN on sapphire substrate
Reina Miyagawa, Shibo Yang, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.), Takaaki Kuwahara, Noriyuki Kuwano, Masatoshi Mitsuhara (Kyushu Univ.) ED2011-74 CPM2011-123 LQE2011-97
The strong demands for high-efficiency light-emitting diodes and for high-sensitivity sensors in the deep-ultraviolet (U... [more] ED2011-74 CPM2011-123 LQE2011-97
pp.5-10
LQE, ED, CPM 2011-11-17
10:55
Kyoto Katsura Hall,Kyoto Univ. Etch-pit method of threading dislocations in epitaxial AlN films
Takuya Nomura, Hideto Miyake, Kazumasa Hiramatsu (Mie Univ.), Yuuki Ryu, Takaaki Kuwahara, Noriyuki Kuwano (Kyusyu Univ.) ED2011-75 CPM2011-124 LQE2011-98
AlN is an attractive substrate for short-wavelength optoelectronics devices based on AlGaN. We have investigated threadi... [more] ED2011-75 CPM2011-124 LQE2011-98
pp.11-14
LQE, ED, CPM 2011-11-17
11:20
Kyoto Katsura Hall,Kyoto Univ. Decreasing Dislocation Density of MOCVD-GaN Using Silicon Dioxide Masks
Masaru Tanimoto, Shiro Sakai (Tokushima Univ.) ED2011-76 CPM2011-125 LQE2011-99
 [more] ED2011-76 CPM2011-125 LQE2011-99
pp.15-18
LQE, ED, CPM 2011-11-17
12:55
Kyoto Katsura Hall,Kyoto Univ. Realization of Freestanding GaN Substrates with High Surface Quality and Low Dislocation Density by Crystal Hardness Control
Hajime Fujikura, Yuichi Oshima, Takehiro Yoshida, Takeshi Megro, Toshiya Saito (Hitachi Cable) ED2011-77 CPM2011-126 LQE2011-100
In the growth of freestanding GaN substrates using our void-assisted separation (VAS) method, we have effectively suppre... [more] ED2011-77 CPM2011-126 LQE2011-100
pp.19-24
LQE, ED, CPM 2011-11-17
13:20
Kyoto Katsura Hall,Kyoto Univ. Interface characterization of MOS structures fabricated on dry-etched GaN and AlGaN
Sungsik Kim, Yujin Hori, Zenji Yatabe, Tamotsu Hashizume (Hokkaido Univ.) ED2011-78 CPM2011-127 LQE2011-101
We have investigated impacts of dry etching of GaN and AlGaN surfaces on interface properties of GaN-based MOS structure... [more] ED2011-78 CPM2011-127 LQE2011-101
pp.25-28
LQE, ED, CPM 2011-11-17
13:45
Kyoto Katsura Hall,Kyoto Univ. Surface Barrier Height Lowering at Above 540 K in AlInN/AlN/GaN Heterostructures
Md. Tanvir Hasan, Hirokuni Tokuda, Masaaki Kuzuhara (Univ. of Fukui) ED2011-79 CPM2011-128 LQE2011-102
This paper describes the temperature dependent two dimensional electron gas (2DEG) properties in AlInN/AlN/GaN heterostr... [more] ED2011-79 CPM2011-128 LQE2011-102
pp.29-33
LQE, ED, CPM 2011-11-17
14:10
Kyoto Katsura Hall,Kyoto Univ. Characterization of insulators and interfaces in GaN-based MIS-diodes
Yasuhiro Iwata, Toshiharu Kubo, Takashi Egawa (NITech) ED2011-80 CPM2011-129 LQE2011-103
 [more] ED2011-80 CPM2011-129 LQE2011-103
pp.35-38
LQE, ED, CPM 2011-11-17
14:50
Kyoto Katsura Hall,Kyoto Univ. Current Transport Characteristics of Quasi-AlGaN/SiC Heterojunction Bipolar Transistors with Various Band Discontinuities
Takafumi Okuda, Hiroki Miyake, Tsunenobu Kimoto, Jun Suda (Kyoto Univ.) ED2011-81 CPM2011-130 LQE2011-104
 [more] ED2011-81 CPM2011-130 LQE2011-104
pp.39-42
LQE, ED, CPM 2011-11-17
15:15
Kyoto Katsura Hall,Kyoto Univ. Analysis of Recovery process in AlGaN/GaN HFET Current Collapse
Taishi Hosokawa, Yusuke Ikawa, Yusuke Kio, Jin-Ping Ao, Yasuo Ohno (Tokushima Univ./STS) ED2011-82 CPM2011-131 LQE2011-105
The recovery process of AlGaN/GaN HFET current collapse is measured. From LED light irradiation experiments, it is estim... [more] ED2011-82 CPM2011-131 LQE2011-105
pp.43-48
LQE, ED, CPM 2011-11-17
15:40
Kyoto Katsura Hall,Kyoto Univ. Fabrication of AlGaN/GaN E-mode HFETs with Enhanced Barrier Structures
Narihiko Maeda, Masanobu Hiroki, Satoshi Sasaki, Yuichi Harada (NTT) ED2011-83 CPM2011-132 LQE2011-106
In recessed-gate AlGaN/GaN Heterostructure field-effect transistors (HFETs) for E-mode operation, enhanced-barrier struc... [more] ED2011-83 CPM2011-132 LQE2011-106
pp.49-54
LQE, ED, CPM 2011-11-17
16:05
Kyoto Katsura Hall,Kyoto Univ. High-accuracy equivalent-circuit-model for GaN-GIT bi-directional switch
Toshihide Ide, Mitsuaki Shimizu, Xu-Qiang Shen (AIST), Tatsuo Morita, Tetsuzo Ueda, Tsuyoshi Tanaka (Panasonic) ED2011-84 CPM2011-133 LQE2011-107
GaN-Gate Injection Transistor(GIT) Bi-directional Switches (BDSWs) is capable of the low on-resistance operation as comp... [more] ED2011-84 CPM2011-133 LQE2011-107
pp.55-60
LQE, ED, CPM 2011-11-17
16:45
Kyoto Katsura Hall,Kyoto Univ. Si Ion Implantated GaN-HEMT for Millimeter-Wave Applications
Masato Nishimori, Kozo Makiyama, Toshihiro Ohki, Atsushi Yamada, Kenji Imanishi, Toshihide Kikkawa, Naoki Hara, Keiji Watanabe (Fujitsu Lab.) ED2011-85 CPM2011-134 LQE2011-108
 [more] ED2011-85 CPM2011-134 LQE2011-108
pp.61-65
LQE, ED, CPM 2011-11-17
17:10
Kyoto Katsura Hall,Kyoto Univ. Ultraviolet Photodetectors using Transparent Gate AlGaN/GaN-HEMT
Tomotaka Narita, Akio Wakejima, Takashi Egawa (NIT) ED2011-86 CPM2011-135 LQE2011-109
Transparent gate AlGaN/GaN HEMT(High Electron Mobility Transistor) on a Si substrate was fabricated. We estimated as cha... [more] ED2011-86 CPM2011-135 LQE2011-109
pp.67-70
LQE, ED, CPM 2011-11-17
17:35
Kyoto Katsura Hall,Kyoto Univ. Concentrating properties of nitride-based solar cells
Mikiko Mori, Shota Yamamoto, Yosuke Kuwahara, Takahiro Fujii, Motoaki Iwaya, Tetsuya Takeuchi, Satoshi Kamiyama, Isamu Akasaki (Meijo Univ.), Hiroshi Amano (Nagoya Univ.) ED2011-87 CPM2011-136 LQE2011-110
In this study, we investigated the concentrating properties of nitride based solar cells up to 200 suns. The conversion ... [more] ED2011-87 CPM2011-136 LQE2011-110
pp.71-75
LQE, ED, CPM 2011-11-18
09:30
Kyoto Katsura Hall,Kyoto Univ. Strain-Induced Effects on the Electronic Band Structure of AlN
Ryota Ishii, Akio Kaneta, Ryan G. Banal, Mitsuru Funato, Yoichi Kawakami (Kyoto Univ.) ED2011-88 CPM2011-137 LQE2011-111
The top of the valence band structure in Wurtzite crystals is split to the irreducible representation of Γ1 and Γ5
by t... [more]
ED2011-88 CPM2011-137 LQE2011-111
pp.77-80
LQE, ED, CPM 2011-11-18
09:55
Kyoto Katsura Hall,Kyoto Univ. Microstructural observation of AlGaN on ELO-AlN
Kimiyasu Ide, Junichi Yamamoto, Motoaki Iwaya, Tetsuya Takeuchi, Satoshi Kamiyama, Isamu Akasaki (Meijo Univ.), Hiroshi Amano (Nagoya Univ.) ED2011-89 CPM2011-138 LQE2011-112
AlGaN-based ultraviolet light emitting device has been achieved as the high spec LED from UV-A to UV-C. It is widely exp... [more] ED2011-89 CPM2011-138 LQE2011-112
pp.81-85
LQE, ED, CPM 2011-11-18
10:20
Kyoto Katsura Hall,Kyoto Univ. 2D-mapping measurement of residual strain in GaN substrates by micro-reflectance spectroscopy
Atsushi Yamaguchi (Kanazawa Inst. Tech.), H. Y. Geng, Haruo Sunakawa, Y. Ishihara, Toshiharu Matsueda, Akira Usui (Furukawa) ED2011-90 CPM2011-139 LQE2011-113
We have developed a novel method to precisely measure very small residual strains (~0.01%) in GaN substrates with micron... [more] ED2011-90 CPM2011-139 LQE2011-113
pp.87-91
LQE, ED, CPM 2011-11-18
10:45
Kyoto Katsura Hall,Kyoto Univ. Effect of Mg co-doping on optical characteristics of GaN:Eu
Hiroto Sekiguchi (Toyohashi Univ. Tech.), Yasufumi Takagi (Hamamatsu Photonics), Tatsuki Otani, Hiroshi Okada, Akihiro Wakahara (Toyohashi Univ. Tech.) ED2011-91 CPM2011-140 LQE2011-114
Rare-earth doped semiconductor is a promising candidate for next generation light-emitting devices due to superior optic... [more] ED2011-91 CPM2011-140 LQE2011-114
pp.93-97
LQE, ED, CPM 2011-11-18
11:10
Kyoto Katsura Hall,Kyoto Univ. Optical gain spectra in semipolar {20-21} oriented green InGaN LDs in comparison with (0001) LDs
Yoon Seok Kim, Akio Kaneta, Mitsuru Funato, Yoichi Kawakami (Kyoto Univ.), Takashi Kyono, Masaki Ueno, Takao Nakamura (Sumitomo Electric) ED2011-92 CPM2011-141 LQE2011-115
 [more] ED2011-92 CPM2011-141 LQE2011-115
pp.99-102
 Results 1 - 20 of 27  /  [Next]  
Choose a download format for default settings. [NEW !!]
Text format pLaTeX format CSV format BibTeX format
Copyright and reproduction : All rights are reserved and no part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the publisher. Notwithstanding, instructors are permitted to photocopy isolated articles for noncommercial classroom use without fee. (License No.: 10GA0019/12GB0052/13GB0056/17GB0034/18GB0034)


[Return to Top Page]

[Return to IEICE Web Page]


The Institute of Electronics, Information and Communication Engineers (IEICE), Japan