Committee |
Date Time |
Place |
Paper Title / Authors |
Abstract |
Paper # |
SDM |
2022-06-21 17:20 |
Aichi |
Nagoya Univ. VBL3F |
Formation of Ultra-Thin Nickel Silicide Layer with controlled Surface Morphology and Crystalline Phase on SiO2 Keisuke Kimura, Noriyuki Taoka, Shunsuke Nishimura, Akio Ohta, Katsunori Makihara, Seiichi Miyazaki (Nagoya. Univ) SDM2022-31 |
Recently, a device with metal nanosheet (MNS) has been attracted much attention. However, control of surface morphology ... [more] |
SDM2022-31 pp.27-30 |
MRIS, ITE-MMS |
2020-10-05 13:55 |
Online |
Online |
Switching field and surface control of CoPt based full granular media by utilizing granular cap layer with ferromagnetic grain boundary Kim Kong Tham, Ryosuke Kushibiki, Tomonari Kamada (Tanaka Kikinzoku), Shin Saito (Tohou Univ.) MRIS2020-2 |
Investigation of magnetic properties and nanostructure for full granular media with CoPt-Gd2O3 granular cap layers (CLs)... [more] |
MRIS2020-2 pp.6-11 |
LQE, CPM, ED |
2017-11-30 16:15 |
Aichi |
Nagoya Inst. tech. |
Mapping of wavy surface morphology of n-GaN using scanning internal photoemission microscopy Kenji Shiojima, Takanori Hashizume (Univ. of Fukui), Masafumi Horikiri, Takeshi Tanaka (SCIOCS), Tomoyoshi Mishima (Hosei Univ.) ED2017-55 CPM2017-98 LQE2017-68 |
We characterized the effect of the surface morphology on electrical properties of the n-GaN drift-layers by using scanni... [more] |
ED2017-55 CPM2017-98 LQE2017-68 pp.27-32 |
SDM |
2017-10-25 16:30 |
Miyagi |
Niche, Tohoku Univ. |
[Invited Talk]
A Study on the Device Characteristics of Pentacene-based OFET with HfO2 Gate Insulator Yasutaka Maeda, Yeyuan Liu, Mizuha Hiroki, Shun-ichiro Ohmi (Tokyo Tech.) SDM2017-54 |
The grain growth of a pentacene thin film, which is a well-known p-type organic semiconductor, is sensitive to underneat... [more] |
SDM2017-54 pp.25-30 |
OME |
2016-12-26 14:55 |
Okinawa |
Urazoe City Center |
Functionalization of the metal surface using the electrolytic reaction and its application Ryoichi Ichino (Nagoya Univ.) OME2016-55 |
I focused on the electrodeposited Zn-Ni-P alloys’ composition, crystal structure and morphology and anti-corrosion perfo... [more] |
OME2016-55 pp.7-10 |
MRIS, ITE-MMS |
2016-12-09 11:20 |
Ehime |
Ehime Univ. |
Influence of Underlayer Material on the Surface and the Crystallographic Qualities of L10-FePt Alloy Thin Film Tomoki Shimizu, Masahiro Nakamura, Ryoma Ochiai (Chuo Univ.), Mitsuru Ohtake (Kogakuin Univ./Chuo Univ.), Masaaki Futamoto (Chuo Univ.), Fumiyoshi Kirino (Tokyo Univ. Arts), Nobuyuki Inaba (Yamagata Univ.) MR2016-40 |
In order to apply FePt alloy thin film with L10 structure to magnetic recording media, etc., it is required to control t... [more] |
MR2016-40 pp.63-67 |
SDM |
2016-10-27 10:25 |
Miyagi |
Niche, Tohoku Univ. |
A Study on Pentacene Film Formation on SiO2 with Wet Process for Bottom-Contact Type OFETs Yasutaka Maeda, Mizuha Hiroki, Shun-ichiro Ohmi (Tokyo Tech.) SDM2016-74 |
The growth of pentacene thin film, which is well known as p-type organic semiconductor, is sensitive for underneath mate... [more] |
SDM2016-74 pp.31-34 |
CPM |
2016-07-23 10:25 |
Ehime |
|
Growth and Shape Controllability of SnO2 Nanowires by Alternate Source Supply Tomoaki Terasako (Ehime Univ.), Masakazu Yagi (Natl. Inst. Technol, Kagawa Coll.) CPM2016-29 |
V apor-liquid-solid (VLS) growth of tin dioxide (SnO2) nanowires (NWs) on the c-plane sapphire substrate co... [more] |
CPM2016-29 pp.21-26 |
R |
2016-06-17 14:50 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
The Study of Electroless Nickel Plating -Surface Morphology and Hardening Behavior- Rieko Mizuuchi, Yuji Hisazato, Kazuya Kodani (Toshiba) R2016-12 |
Electroless nickel plating is widely used in industry. Electroless nickel plating has the following features, excellent... [more] |
R2016-12 pp.19-24 |
SDM |
2015-10-30 13:50 |
Miyagi |
Niche, Tohoku Univ. |
A Study on the Device Characteristics of Pentacene-based OFET with HfO2 Gate Insulator Yasutaka Maeda, Yeyuan Liu, Shun-ichiro Ohmi (Tokyo Tech.) SDM2015-80 |
The grain growth of pentacene thin film, which is well known as p-type organic semiconductor, is sensitive for underneat... [more] |
SDM2015-80 pp.49-52 |
EMD, CPM, OME |
2013-06-21 16:55 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
ZnO film growth using high-energy H2O generated by a catalytic reaction
-- Effect of low-temperature buffer layer -- Kazuki Takezawa, Tomoki Nakamura, Takahiro Oyanagi, Takahiro Kato (Nagaoka Univ. of Tech.), Hironori Katagiri, Koichiro Oishi, Kazuo Jimbo (Nagaoka. Nat. Coll. Technol.), Kanji Yasui (Nagaoka Univ. of Tech.) EMD2013-23 CPM2013-38 OME2013-46 |
ZnO thin films were grown on glass substrates through a reaction between dimethylzinc and high-energy H2O. The latter wa... [more] |
EMD2013-23 CPM2013-38 OME2013-46 pp.89-94 |
EMD |
2012-12-01 14:50 |
Chiba |
Chiba Institute of Technology |
Effect of Current Load on Fretting of Au-plated contacts Wanbin Ren, Peng Wang, Shengjun Xue (Harbin Inst. of Tech.) EMD2012-87 |
The fretting corrosion behavior of Au-plated contacts is studied at various current loads of 10, 100, 500 and 1000mA. Th... [more] |
EMD2012-87 pp.133-140 |
CPM |
2012-10-26 13:50 |
Niigata |
|
Effect of a low-temperature buffer layer on the properties of ZnO films grown on glass substrates using catalytically generated high-energy H2O Takahiro Oyanagi, Kazuki Takezawa, Takahiro Kato (Nagaoka Univ. Technol), Hironori Katagiri, Kazuo Jimbo (NNCT), Kanji Yasui (Nagaoka Univ. Technol) CPM2012-94 |
ZnO thin films were grown through a reaction between dimethylzinc and high-energy H_{2}O produced by a Pt-catalyzed H_{2... [more] |
CPM2012-94 pp.7-11 |
OME |
2012-10-17 16:40 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Fullerene derivative thin film fabricated by electrospray deposition technique Kenji Takagi, Kazumasa Takeshi, Takeshi Fukuda, Norihiko Kamata (Saitama Univ.), Jungmyoung Ju, Yutaka Yamagata, Yusuke Tajima (RIKEN) OME2012-54 |
A solubility of n- and p-type organic materials against organic solvent is necessary to realize a multilayer organic pho... [more] |
OME2012-54 pp.45-48 |
OME |
2010-10-22 13:50 |
Tokyo |
NTT Musashino R&D Center |
Realization of Smooth Organic Thin Film by Electrospray Deposition Technique Takashi Asano, Kenji Takagi, Takeshi Fukuda (Saitama Univ.), Jungmyoung Ju (RIKEN), Zentaro Honda, Norihiko Kamata, Yusuke Tajima, Tetsuya Aoyama (Saitama Univ.), Yutaka Yamagata (RIKEN) OME2010-48 |
To realize bulk-heterojunction structure in an organic photovoltaic cell, the solubility for n-type and p-type organic m... [more] |
OME2010-48 pp.11-14 |
OME |
2010-05-27 13:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Surface Modification of Metal-Oxide Electrode by Self-Assembled Monolayer Seong-Ho Kim, Yuuya Umemoto, Hanae Ohtsuka, Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. of Agr. & Tech.) OME2010-17 |
Self-assembled monolayers (SAMs) were prepared on the surface of ITO, which is one of the most commonly used electrode f... [more] |
OME2010-17 pp.1-6 |
OME |
2009-09-03 13:00 |
Tokyo |
Kikai-Shinko-Kaikan Bldg |
The Effect of Surface-Initiator SAM for Vapor Deposition Polymerization of Vinylcarbazole Yuya Umemoto, Seong-Ho Kim, Kuniaki Tanaka, Hiroaki Usui (Tokyo Univ. A & T) OME2009-36 |
In general, vapor-deposited thin films lack interfacial stability due to the nature of physical adsorption on the substr... [more] |
OME2009-36 pp.1-6 |
SDM |
2007-10-05 15:00 |
Miyagi |
Tohoku Univ. |
Atomic order flatting technology of silicon surface Tomoyuki Suwa, Rihito Kuroda, Akinobu Teramoto, Tadahiro Ohmi (Tohoku Univ.) SDM2007-190 |
In this paper, atomically flat silicon surface can be realized by annealing at 1200℃ in Argon gas atmosphere, and it is ... [more] |
SDM2007-190 pp.57-59 |
SDM, ED, CPM |
2007-05-24 14:30 |
Shizuoka |
Shizuoka Univ. |
Growth of high quality ZnO film and application for UV detector Takao Hayashi, Atsushi Nakamura, Jiro temmyo (Shizuioka Univ.), Navarro Tober,Alvaro, Munoz Merino,Elias (UPM) |
ZnO thin films were grown by remote plasma enhanced MOCVD. Diethyl zinc (DEZn) were used as group-II source. Oxygen gas ... [more] |
|
MW, SCE |
2005-04-27 16:15 |
Tokyo |
Kikai-Shinko-Kaikan Bldg. |
Characterization of the High Power Microwave properties of Superconductor Films Haruhiko Obara, Shin Kosaka (AIST) |
Microwave power dependence of surface resistance of superconductor films was measured using a dielectric resonator metho... [more] |
SCE2005-10 MW2005-10 pp.51-54 |