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All Technical Committee Conferences (Searched in: All Years)
| Committee | Date Time | Place | Paper Title / Authors | Abstract | Paper # | |
| MRIS, ITE-MMS | 2024-06-06 15:00 |
Miyagi | Tohoku Univ., RIEC (Primary: On-site, Secondary: Online) |
High rate RF sputtering of MgO underlayer by hot cathode method with porous target for heat assisted magnetic recording media Kota Yamada, Daiki Miyazaki, Yuki Hirokawa, Seong-Jae Jeon, Akihiro Shimizu, Shintaro Hinata, Tomoyuki Ogawa, Shin Saito (Tohoku Univ.), Kosaku Iwatani (TOSHIMA Manufacturing Co., Ltd.) |
(To be available after the conference date) [more] | |
| ED | 2023-12-07 14:50 |
Aichi | WINC AICHI | Fabrication of Hafnium Nitride Spindt-type Field Emitter Arrays by Triode High Power Pulsed Magnetron Sputtering Shun Kondo (Seikei University/AIST), Takeo Nakano, Md. Suruz Mian (Seikei University), Masayoshi Nagao, Hiromasa Murata (AIST)  ED2023-41 |
We have been attempting to fabricate Spindt-type emitter using the triode high-power pulsed magnetron sputtering (t-HPPM... [more] | ED2023-41 pp.11-14 |
| US | 2023-11-27 13:45 |
Shizuoka | Shizuoka University | Improvement of in-plane orientation and piezoelectricity of c-axis parallel oriented ZnO films and their application to thickness shear-mode resonators
-- Investigation on limiting of particle irradiation to substrate during sputtering deposition -- Naoki Tomiyama, Shinji Takayanagi (Doshisha Univ.), Yanagitani Takahiko (Waseda Univ.) US2023-49 |
ZnO films with the crystalline c-axis parallel to the substrate can excite shear waves and are suitable for thickness-sh... [more] | US2023-49 pp.34-39 |
| MIKA (3rd) |
2023-10-10 15:35 |
Okinawa | Okinawa Jichikaikan (Primary: On-site, Secondary: Online) |
[Poster Presentation]
Epitaxial piezoelectric thin film multilayer structure for RF filters Satoshi Tokai, Yanagitani Takahiko (Waseda Univ.) |
Wireless communication devices such as smartphones are equipped with many frequency filters to transmit and receive only... [more] | |
| EA, US (Joint) |
2022-12-22 16:50 |
Hiroshima | Satellite Campus Hiroshima | [Poster Presentation]
Sputter epitaxial LiNbO3 film shear mode thin film resonators Shinya Kudo (Wseda Univ.), Takahiko Yanagitani (Waseda Univ.) US2022-66 |
LiNbO3 have been used for the SAW filters because of their high Q and k. However, LiNbO3 filter have not used in the BAW... [more] | US2022-66 pp.86-91 |
| ED | 2022-12-08 14:10 |
Aichi | 12/8 Nagoya University, 12/9 WINC AICHI | Measurement of work function of hafnium nitride thin films prepared by dc and rf magnetron sputtering Tomoaki Osumi (Kyoto Univ.), Masayoshi Nagao (AIST), Yasuhito Gotoh (Kyoto Univ.) ED2022-53 |
Hafnium nitride(HfN) thin films were prepared by dc and rf magnetron sputtering. The nitrogen compositions of HfN thin f... [more] | ED2022-53 pp.15-17 |
| SDM | 2022-10-19 17:20 |
Online | Online | A study on threshold voltage control of MFSFET utilizing ferroelectric nondoped HfO2 thin films Masakazu Tanuma, Joong-Won Shin, Shun-ichiro Ohmi (Tokyo Tech) SDM2022-63 |
Ferroelectric HfO2 thin films are able to be formed on Si substrate, which is difficult for conventional materials due t... [more] | SDM2022-63 pp.38-42 |
| SDM, ED, CPM | 2022-05-27 14:40 |
Online | Online | Reactive Sputtering of Nitride Dielectric Film for Silicon Photonics Applications Takaaki Fukushima, Jose A. Piedra Lorenzana, Rui Tsuchiya, Takeshi Hizawa, Yasuhiko Ishikawa (Toyohashi Univ. Tech.) ED2022-10 CPM2022-4 SDM2022-17 |
SiNx possesses a thermo-optic coefficient smaller by approximately one order of magnitude than that of Si, being effecti... [more] | ED2022-10 CPM2022-4 SDM2022-17 pp.13-16 |
| CPM | 2021-10-27 10:30 |
Online | Online | Study on the low-temperature deposition method of SiNx film for Cu-TSV Masaru Sato, Mayumi B. Takeyama (Kitami Inst. of Tech.) CPM2021-21 |
For Cu through silicon via in the 3D-LSI, It is desired to realize a deposition method of an insulating film less than 2... [more] | CPM2021-21 pp.5-7 |
| SDM | 2021-10-21 13:00 |
Online | Online | A study on Ar/N2-plasma sputtering gas pressure dependence on the LaBxNy insulator formation for non-volatile memory applications Eun-Ki Hong, Shun-ichiro Ohmi (Tokyo Tech.) SDM2021-46 |
In this study, we investigated Ar/N2-plasma sputtering gas pressure dependence on the LaBxNy insulator formation. The fl... [more] | SDM2021-46 pp.8-11 |
| US | 2020-11-05 13:00 |
Aichi | Effect of negative ion bombardment increased in low-pressure sputtering deposition on crystallinity and piezoelectric property of ScAlN thin film Takumi Tominaga, Shinji Takayanagi (Doshisha Univ.), Takahiko Yanagitani (Waseda Univ.) US2020-43 |
Since the ScAlN film has much higher piezoelectric response than the AlN film, it is expected to be applied to BAW devic... [more] | US2020-43 pp.1-6 |
|
| CPM | 2019-08-26 14:20 |
Hokkaido | Kitami Institute of Technology | Preparation of conductive oxide sintered targets for AZO thin films deposited by sputtering method Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Koutaro Nagata (Niigata Univ.) CPM2019-39 |
In this study, AZO conductive oxide sintered bodies with 2wt.% Al2O3 added to ZnO were prepared at sintering temperature... [more] | CPM2019-39 pp.9-12 |
| SCE | 2019-08-09 13:05 |
Ibaraki | National Institute of Advanced Industrial Science and Technology | Preparation and evaluation of Nb3Ge superconducting thin films Akira Kawakami, Hirotaka Terai (NICT), Yoshinori Uzawa (NAOJ) SCE2019-13 |
The Nb3Ge thin film with the A15 crystal structure exhibits a superconducting transition temperature of up to 23 K, and ... [more] | SCE2019-13 pp.27-30 |
| US | 2018-11-02 15:20 |
Aichi | Deposition of c-axis parallel oriented ZnO film on entire surface of silica glass pipe Yuta Takamura (Doshisha Univ.), Shinji Takayanagi (Nagoya Inst. Tech.), Mami Matsukawa (Doshisha Univ.), Takahiko Yanagitani (Waseda Univ.) US2018-68 |
SH type SAW sensor can measure the viscosity, conductivity and permittivity of a liquid because it propagate to liquid /... [more] | US2018-68 pp.25-30 |
|
| CPM, IEE-MAG | 2018-11-01 14:50 |
Niigata | Machinaka campus Nagaoka | Consideration of bilayer film with Zn and AZO deposited by sputtering method Hidehiko Shimizu, Haruo Iwano, Takahiro Kawakami, Yasuo Fukushima, Koutaro Nagata, Nozomu Tsuboi (Niigata Univ.) CPM2018-45 |
In order to preparation of Zn doped AZO film, deposition of AZO films on Zn films were attempted by dc magnetron sputter... [more] | CPM2018-45 pp.21-24 |
| SDM | 2018-10-18 10:20 |
Miyagi | Niche, Tohoku Univ. | Thin film formation of ferroelectric undoped HfO2 on Si(100) by RF magnetron sputtering Min Gee Kim, Rengie Mark D. Mailig, Shun-ichiro Ohmi (Tokyo Tech.) SDM2018-58 |
In this study, we investigated thin film formation of ferroelectric undoped HfO2 directly deposited on p-Si(100). By po... [more] | SDM2018-58 pp.31-34 |
| CPM | 2017-07-22 11:33 |
Hokkaido | [Invited Talk]
Development of Low Damage Facing Target Sputter-deposition Processes Yoichi Hoshi (Tokyo Polytechnic Univ.) CPM2017-38 |
About 43 years ago, I firstly challenged the deposition of YIG films by using a conventional sputtering system. Depositi... [more] | CPM2017-38 pp.89-94 |
|
| SDM | 2015-10-30 14:30 |
Miyagi | Niche, Tohoku Univ. | Low Work Function LaB6 Thin Films Prepared by Nitrogen Doped LaB6 Target Sputtering Hidekazu Ishii (Tohoku Univ), Takahashi Kentarou (Sumitomo Osaka Cement), Tetsuya Goto, Shigetoshi Sugawa, Tadahiro Ohmi (Tohoku Univ) SDM2015-81 |
LaB6 thin films were deposited by magnetron sputtering, and their work function was investigated. It was found that the ... [more] | SDM2015-81 pp.53-56 |
| US | 2015-09-03 15:50 |
Hokkaido | Electromechanical coupling coefficients of c-axis parallel oriented ScAlN films grown by ion-beam assisted RF magnetron sputtering Mineki Oka, Shinji Takayanagi (Doshisha Univ.), Takahiko Yanagitani (Waseda Univ.), Mami Matsukawa (Doshisha Univ.) US2015-51 |
Recently, Akiyama et al. found that doping scandium into AlN film increases the number of piezoelectric coefficient d33 ... [more] | US2015-51 pp.31-35 |
|
| CPM | 2015-08-11 09:40 |
Aomori | Low temperature deposition of HfNx film by radical reaction Masaru Sato, Mayumi B. Takeyama, Atsushi Noya (Kitami inst. of Technol.) CPM2015-40 |
We have demonstrated the preparation of a low-temperature deposited HfNx film as a diffusion barrier applicable to the C... [more] | CPM2015-40 pp.47-50 |
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